2011
DOI: 10.1016/s1005-0302(11)60081-9
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Effect of Phosphor Addition on Intergranular Exchange Coupling of Co-Pt Thin Films

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Cited by 5 publications
(2 citation statements)
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“…The iron alloy films were deposited on conductive fluorinedoped tin oxide (FTO) glass substrate by DC magnetron sputtering technique and the target was a commercial available iron disk with chips of desired doping element pasted on the surface. The concentration of doping element (M, M = Sn or Ge) is defined as M/(M+Fe) mole ratios were tuned by the relative areas of the pasted chips [24] and determined by EDS. Prior to sputtering deposition, FTO substrates were sonically cleaned using acetone, ethanol, and deionized water each for 10 min in that sequence.…”
Section: Methodsmentioning
confidence: 99%
“…The iron alloy films were deposited on conductive fluorinedoped tin oxide (FTO) glass substrate by DC magnetron sputtering technique and the target was a commercial available iron disk with chips of desired doping element pasted on the surface. The concentration of doping element (M, M = Sn or Ge) is defined as M/(M+Fe) mole ratios were tuned by the relative areas of the pasted chips [24] and determined by EDS. Prior to sputtering deposition, FTO substrates were sonically cleaned using acetone, ethanol, and deionized water each for 10 min in that sequence.…”
Section: Methodsmentioning
confidence: 99%
“…The iron-base alloy films were deposited on conductive fluorine-doped tin oxide (FTO) glass substrate by radio frequency (RC) magnetron sputtering technique and the target was a commercial available Fe 2 O 3 disk with chips of CeO 2 (round tablets with a diameter of 2mm and a thickness of 1mm) pasted on the surface. The concentration of doping element was defined as Ce/(Ce+Fe) atom ratio, which was tuned by the relative area of the pasted chips [18]. Prior to sputtering deposition, FTO substrates were sonically cleaned using acetone, ethanol and de-ionized water each for 15min in that sequence.…”
Section: Methodsmentioning
confidence: 99%