Effect of oxygen pressure on the microstructure and properties of the Al2O3–SiO2 thin films deposited by E-beam evaporation

Electron beam deposition of ceramic coatings at fore-vacuum pressure

“…Another approach is the use of electron beam evaporation. This method is technologically simple, and it provides relatively high deposition rates of about several micrometers per hour, and allows a wide range of process parameters [11][12][13]. The operating pressure for electron beam evaporation is normally less than 10 -2 Pa.…”

Effect of iron doping on the properties of nanopowders and coatings on the basis of Al2O3 produced by pulsed electron beam evaporation

“…The amorphous phase, which usually transforms into the γ phase of Al 2 O 3 during further annealing, is most often formed during the deposition of thin films on relatively cold substrates (25-250°C [23][24][25]) by means of electron evaporation. In turn, depending on the method of the preparation, the γ phase may remain thermally stable up to very high temperatures on the order of 1000-1100°C [7].…”

Investigation into phase transformations and structural and luminescent properties of multiphase coatings and aluminum oxide nanopowder prepared by evaporation with a pulsed electron beam

“…The results of these studies show that the routes of formation and phase transformation of the Al 2 O 3 based nanomateri als upon further annealing are characterized by excep tional diversity and depend on manifold factors: the initial precursor, the method of synthesis used and its conditions, the temperature and crystallographic ori entation of the substrate [17,18], etc. An amorphous phase, which is further transformed into the γ phase Al 2 O 3 upon annealing, is most often formed upon the deposition of thin films onto relatively cold substrates (25-250°C) [19][20][21] using evaporation by the elec tron beam. The γ phase in turn can remain thermally stable up to high temperatures of approximately 1000-1100°C [4].…”