2010
DOI: 10.1016/j.fusengdes.2010.02.011
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Effect of oxygen on hydrogen retention in W deposition layers formed by hydrogen RF plasma

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Cited by 3 publications
(2 citation statements)
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“…sputtering device. A schematic diagram of the device and the experimental procedure were reported previously [1,4]. The gas pressure, RF power and plasma discharge period for deposition in the present study are summarized in Table 1.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…sputtering device. A schematic diagram of the device and the experimental procedure were reported previously [1,4]. The gas pressure, RF power and plasma discharge period for deposition in the present study are summarized in Table 1.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore, hydrogen behavior in tungsten deposits is not necessarily the same as that in tungsten bulk. In order to investigate basic behaviors of hydrogen isotopes in tungsten deposits, the present authors have produced tungsten deposit samples by an RF plasma sputtering device [1][2][3][4]. It have been reported in previous papers that the produced tungsten deposits contain a numerous bubbles and retain a large amount of hydrogen isotopes [3].…”
Section: Introductionmentioning
confidence: 99%