Abstract:Driven by overlay shrinks and increasing product diversification in advanced fabs, automatic control of correctable overlay coefficients has become critical to semiconductor manufacturing. Although numerous reports have shown the compelling benefits of automatic run-to-run feedback control, one important issue has received very little attention to date. In many state-of-the-art fabs, reticle to wafer alignment is performed against marks that were printed at the firstor zero-level, whereas overlay is still meas… Show more
In semiconductor manufacturing, the multilayer overlay lithography process is a typical multistage manufacturing process; one of the key factors that restrict the reliability and yield of integrated circuit chips is overlay error between the layers.
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