An empirical study-based state space model for multilayer overlay errors in the step-scan lithography process

He, Fenghua; Zhang, Zhisheng

doi:10.1039/c5ra07164j

Cited by 10 publications

(1 citation statement)

References 19 publications

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“…From the perspective of overlay correction, the overlay error can be divided into the correctable part and the noncorrectable part. The former part includes inter-field and intra-field overlay, and they can be further corrected by the parameters which describe the geometrical deformation of the wafer and reticle patterns, generally covering the parameters of translation, rotation, magnification, scale and orthogonality, as shown in figure 2 30 . While the latter part cannot be corrected and it is mainly composed of non-systematic overlay and process correction residual 31,32 .…”

Section: Overlay Classificationsmentioning

confidence: 99%

Review of overlay error and controlling methods in alignment system for advanced lithography

Hao¹,

Qi²

2022

Thirteenth International Conference on Information Optics and Photonics (CIOP 2022)

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Acting as one of the three critical indicators to evaluate the performance of lithography scanners, overlay has been a vital factor which seriously affects the electric property, life span and reliability of integrated circuits (IC). With continuous developments of technology nodes and applications of resolution enhancement technologies (RET), current resolution of the scanners has shrunk to 7 nm and beyond, proposing more stringent requirements for measuring, monitoring and correcting the overlay error. To ensure that the overlay budget fully met by the scanner, advanced optical technologies and holistic alignment approaches have been gradually applied to the alignment system of the scanner, revealing that an integrated methodology in which multiple technologies are adopted proved to be valid and effective in reducing the overlay error in present technology nodes.In this article, the exact concept of overlay error is provided, and on this basis different methods to describe the overlay error are comprehensively analyzed from the perspectives of classifications, sources, quality control and correcting models. Then the systematic relationship between alignment and overlay is illustrated. Recent improvements in the alignment system are also the key points here to systematically reduce the overlay error, including the optimization of the alignment optical path, mark types and design procedures, as well as the application of optimal color weighting (OCW), wafer alignment model mapping (WAMM) and sampling scheme optimization (SSO) algorithms. Based on the combined application and iteration of these technologies, it is believed that the on-product overlay (OPO) can be further compressed to support the continuous tightening of the overlay budget in the industry of IC.

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Section: Overlay Classificationsmentioning

confidence: 99%

Review of overlay error and controlling methods in alignment system for advanced lithography

Hao¹,

Qi²

2022

Thirteenth International Conference on Information Optics and Photonics (CIOP 2022)

View full text Add to dashboard Cite

show abstract

Management Suggestions for Process Control of Semiconductor Manufacturing: An Operations Research and Data Science Perspective

Khakifirooz

Fathi

Chien

et al. 2019

Computational Intelligence and Optimization Methods for Control Engineering

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State space model and numerical simulation of overlay error for multilayer overlay lithography processes

Zhang

2017

2017 2nd International Conference on Image, Vision and Computing (ICIVC)

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An empirical study-based state space model for multilayer overlay errors in the step-scan lithography process

Abstract: In semiconductor manufacturing, the multilayer overlay lithography process is a typical multistage manufacturing process; one of the key factors that restrict the reliability and yield of integrated circuit chips is overlay error between the layers.

Cited by 10 publications

References 19 publications

Review of overlay error and controlling methods in alignment system for advanced lithography

Review of overlay error and controlling methods in alignment system for advanced lithography

Management Suggestions for Process Control of Semiconductor Manufacturing: An Operations Research and Data Science Perspective

State space model and numerical simulation of overlay error for multilayer overlay lithography processes

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