1977
DOI: 10.1063/1.89544
|View full text |Cite
|
Sign up to set email alerts
|

Effect of O2 pressure during deposition on properties of rf-sputtered Sn-doped In2O3 films

Abstract: The electrical and optical properties of rf-sputtered Sn-doped In2O3 (ITO) films have been found to depend strongly on the O2 partial pressure during deposition. For the sputtering conditions used, films with both low electrical resistivity (ρ ∼ 3 × 10−4 Ω cm) and high visible transmission (∼ 90%) were obtained only over a narrow range of O2 pressures, from 3 × 10−5 to 4 × 10−5 Torr. Our results appear to explain the difficulties that have previously been encountered in obtaining high-quality ITO films, and in… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

5
41
0
1

Year Published

1979
1979
2021
2021

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 133 publications
(47 citation statements)
references
References 12 publications
5
41
0
1
Order By: Relevance
“…51,52 In this work, we have used megnetron sputtering to fabricate the samples, and the resultant film is the smooth, continuous ITO layer, as characterized by the atomic force microscope (AFM) in Fig. 2(b).…”
Section: Resultsmentioning
confidence: 99%
“…51,52 In this work, we have used megnetron sputtering to fabricate the samples, and the resultant film is the smooth, continuous ITO layer, as characterized by the atomic force microscope (AFM) in Fig. 2(b).…”
Section: Resultsmentioning
confidence: 99%
“…The consequence of impurity/defect centers is the unacceptably large value of absorption observed in some sputtered and thermally evaporated layers 3 of ITO compared with those reported which have been fabricated by other techniques. 4,[8][9][10][11] A plot of two reported sets of data is shown in Fig. 2.…”
Section: Absorption By Defects and Impuritiesmentioning
confidence: 99%
“…Results from sputtered films (dc and magnetron) have already achieved this goal. 4,[8][9][10][11] Sputtering and vacuum evaporation are preferred techniques for film deposition because they are compatible with present semiconductor device technology.…”
Section: Absorption By Defects and Impuritiesmentioning
confidence: 99%
“…The theory of In 2 O 3 explains the band structure of ITOs. Some scientists have investigated the electric structure of ITO films and In 2 O 3 (J. C. Fan, Bachner, & Foley, 1977). ITO's crystal structure hasn't discovered clearly up to now because it is complicated.…”
Section: Electrical Properties Of Ito Filmsmentioning
confidence: 99%