Effect of multiple laser irradiations on silica at 1064 and 355?nm

Natoli, Jean-Yves; Bertussi, Bertrand; Commandré, Mireille

doi:10.1364/ol.30.001315

Cited by 45 publications

(20 citation statements)

References 8 publications

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“…of the conditioning gain, has been also experimentally observed. [26][27][28][29] As shown in Section 2.4, CM1 appeared to also be able to reproduce this particular logarithmic-like behavior. Further, within this horizontal logarithmic scale, the slope of g depends on the conditioning fluence, 18 as it has been observed 22 for λ = 532 nm and λ = 355 nm.…”

Section: Discussionmentioning

confidence: 57%

Modeling laser conditioning of KDP crystals

Duchateau

2009

SPIE Proceedings

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When potassium dihydrogen phosphate crystals (KH 2 PO 4 or KDP) are illuminated by multi-gigawatt nanosecond pulses, damages may appear in the crystal bulk. One can increase damage resistance through a conditioning that consists in carrying out a laser pre-exposure of the crystal. The present paper addresses the modeling of laserinduced conditioning of KDP crystals. The method is based on heating a distribution of defects, the cooperation of which may lead to a dramatic temperature rise. The conditioning is assumed to be due to a decrease in the defect absorption efficiency. Two scenarios associated with various defect natures are proposed and these account for certain of the observed experimental facts. For instance, in order to improve the crystal resistance to damage, one needs to use a conditioning pulse duration shorter than the testing pulse. Also, a conditioning scenario based on the migration of point (atomic-size) defects allows the reproduction of a logarithmic-like evolution of the conditioning gain with respect to the number of laser pre-exposures. Moreover, this study aims at refining the knowledge regarding the precursor defects responsible for the laser-induced damage in KDP crystals. Within the presented modeling, the best candidate permitting the reproduction of major experimental facts is comprised of a collection of one-hundred-nanometer structural defects associated with point defects as for instance cracks and couples of oxygen interstitials and vacancies.

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Section: Discussionmentioning

confidence: 57%

Modeling laser conditioning of KDP crystals

Duchateau

2009

SPIE Proceedings

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“…Damage precursors such as surface flaws, electronic defects, and nanoparticles absorb subband gap light raising the temperature around the precursors high enough to result in the optical damage [1][2][3][4]. It is now admitted that nanometric absorbing defects inherent to the manufacturing process are at the origin of low-damage thresholds in optical thin films and substrates [5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. In the case of metallic impurities embedded in optical materials, laserinduced damage is primarily initiated by the temperature rise of inclusions.…”

Section: Introductionmentioning

confidence: 99%

Investigation of laser-induced damage by nanoabsorbers at the surface of fused silica

et al. 2012

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A model for describing laser-induced damage in optical materials by nanosecond laser pulses is investigated. The laser-damage critical fluence is obtained based on calculating the light absorption of nanoabsorbers by using Mie theory and solving the heat equation. Considering a power law distribution of nano-absorbers, we calculated the damage probability at the surface of fused silica including Pt particles. The theoretical results calculated with appropriate parameters are applied to fit the experimental data in order to identify the properties of nanodefects.

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“…Does the defect density depend on the material, and which material features the defect ensemble with the highest damage threshold? Also, is the defect ensemble a stable system or does it change under irradiation [2]?…”

Section: Introductionmentioning

confidence: 99%

Defect formation in oxide thin films

et al. 2011

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In nanosecond laser damage investigations, the specific defect density in the optical component or thin film plays the key role in triggering optical breakdown. UV irradiation can induce additional defects in optical materials before the damaging event takes place. This increased defect density can even be the main cause for UV laser damage as shown before in fused silica. Moving on to oxide thin films, this contribution will present studies on SiO 2 , Al 2 O 3 , and HfO 2 ion beam sputtered coatings. Pure material single layers as well as composite material single layers comprised of two oxides have been investigated concerning their tendency to generate additional defects resulting from UV laser irradiation. Within this work, tests at 355 nm and 266 nm have been performed and are compared.

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Effect of multiple laser irradiations on silica at 1064 and 355?nm

Cited by 45 publications

References 8 publications

Modeling laser conditioning of KDP crystals

Modeling laser conditioning of KDP crystals

Investigation of laser-induced damage by nanoabsorbers at the surface of fused silica

Defect formation in oxide thin films

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