Effect of Microstructure on the Thermal Conductivity of Plasma Sprayed Y2O3 Stabilized Zirconia (8% YSZ)

Hu, Ningning; Khan, Matiullah; Wang, Yongzhe; Song, Xuemei; Lin, Chucheng; Chang, Chengkang; Zeng, Yi

doi:10.3390/coatings7110198

Cited by 22 publications

(10 citation statements)

References 25 publications

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“…Machining tools are probably one of the most exigent applications, which require characteristics, such as hardness at elevated temperatures, high abrasion resistance, chemical stability, toughness, and stiffness [36][37][38][39][40][41][42][43][44][45]. In addition, PVD is also able to produce coatings with excellent adhesion, homogeneous layers, designed structures, graduated properties, controlled morphology, high diversity of materials and properties, among others [46][47][48][49][50].…”

Section: Pvd Coatingsmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand.

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Section: Pvd Coatingsmentioning

confidence: 99%

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

et al. 2018

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“…The granular form of the voids can be explained by the partial melting of large agglomerated particle clusters in the plasma jet during the APS process. The pores and their granular structure serve to reduce the thermal conductivity of the coating due to the strong phonon scattering from the air entrapped in the pores and/or boundaries of unmelted particles [36,[41][42][43][44]. Figure 4 shows the EDX spectrum for particles and granules that described above with peaks for the YAG top coat constituent elements Y, Al and O.…”

Section: X-ray Diffractionmentioning

confidence: 99%

Thermal shock resistance of yttrium aluminium oxide Y3Al5O12 thermal barrier coating for titanium alloy

Almomani¹,

Al‐Widyan²,

Mohaidat³

2020

JMES

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The high strength-to- weight ratio of titanium alloys allows their use in jet engines. However, their use is restricted by susceptibility to oxidation at high temperatures. In this study, the possibility of increasing the operating temperature of titanium alloys through using Yttrium Aluminum Oxide (YAG) as a thermal barrier coating material for Ti-6Al-4V substrate is studied. The study concludes that YAG can be utilized to increase the operating temperature of Ti-6Al-4V titanium alloy from around 350 °C to 800 °C due to its low thermal conductivity and phase stability up to its melting point. In addition, its lower oxygen diffusivity in comparison with the standard YSZ material will provide a better protection of the titanium substrate from oxidation. In this work, coating was created using atmospheric plasma spray. X-ray Diffraction (XRD) and Scanning Electron Microscope (SEM) were used to examine coatings' composition and structure. The coating was characterized by thermal shock test, Vickers hardness test and adhesion strength test. X-ray diffraction indicated that the coating was of a partially crystalline Y3Al5O12 composition. The coating was porous with excellent thermal shock resistance at 800 oC, with a Vickers micro-hardness of 331.35 HV and adhesion strength of 17.6 MPa.

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“…With this technological evolution, other industries benefit by reducing maintenance costs, improving productivity and remaining economically competitive [51]. With PVD coating, it is possible to decrease friction and improve thermal properties [3,15,[52][53][54]. The material technology evolution has brought some variants to conventional coating techniques, such as, High-Power Impulse/Pulse Magnetron-HiPIMS/HPPMS [43,[55][56][57].…”

Section: Physical Vapor Deposition Techniquementioning

confidence: 99%

Numerical Simulation Applied to PVD Reactors: An Overview

et al. 2018

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The technological evolution in the last century also required an evolution of materials and coatings. Therefore, it was necessary to make mechanical components subject to heavy wear more reliable, improving their mechanical strength and durability. Surfaces can contribute decisively to extending the lifespan of mechanical components. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) technologies have emerged to meet the new requirements that have enabled a remarkable improvement in the morphology, composition and structure of films as well as an improved adhesion to the substrate allowing a greater number of diversified applications. Thin films deposition using PVD coatings has been contributing to tribological improvement, protecting their surfaces from wear and corrosion, as well as enhancing their appearance. This process can be an advantage over other processes due to their excellent properties and environmental friendly behavior, which gives rise to a large number of studies in mathematical modelling and numerical simulation, like finite element method (FEM) and computational fluid dynamics (CFD). This review intends to contribute to a better PVD process knowledge, in the fluids and heat area, using CFD simulation methods focusing on the process energy efficiency improvement regarding the industrial context with the sputtering technique.

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Effect of Microstructure on the Thermal Conductivity of Plasma Sprayed Y2O3 Stabilized Zirconia (8% YSZ)

Cited by 22 publications

References 25 publications

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

Thermal shock resistance of yttrium aluminium oxide Y3Al5O12 thermal barrier coating for titanium alloy

Numerical Simulation Applied to PVD Reactors: An Overview

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