Effect of metal cluster ions on the low-temperature growth of YBa2Cu3Oy thin films

Kaneko, Norio; Kawasaki, Takehiko; Motoi, Taiko; Yamamoto, Keisuke

doi:10.1016/0921-4534(94)90229-1

Cited by 1 publication

(1 citation statement)

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“…It seems meaningful to fit the data in Fig. 10͑c͒, that has been explained by Kaneko et al 32 and Matsubara et al 33 From this, we suppose that raising the substrate temperature and minimizing the output noise level could fabricate films with the same quality as that grown at 150 mTorr under this 200 mTorr pressure condition, i.e., single phase in crystalline and pure single orthorhombic I phase in the as-grown films. These curve fitting results may support the above assumption that the ballistic mode of transportation of sputtered particles still exists at pressure lower than 100 mTorr.…”

Section: Resultssupporting

confidence: 53%

Pressure effect on YBa2Cu3O7 thin film growth in off-axis radio frequency magnetron sputtering

Tsai

Huang

et al. 1995

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inAtomic oxygen effect on the in situ growth of stoichiometric YBa2Cu3O7−δ epitaxial films by facing targets 90°o ffaxis radiofrequency magnetron sputtering YBa 2 Cu 3 O 7Ϫx ͑123͒ thin films were fabricated on ͑100͒ MgO substrates by off-axis single target radio frequency ͑rf͒ magnetron sputtering. Our study focused on the effect of chamber pressure on the composition, microstructure, and superconductive properties on transition behavior and T c of the grown film studied. An empirical formula was derived to explain the dependence of the deposition rate of various components on the pressure. Next, we compared the transport mechanism of the sputtered particles between the off-axis rf and the on-axis direct current sputtering and determined the processing conditions that result in superconducting films of better quality. According to our findings, growth at higher pressures ͑Ͼ100 mTorr͒ produces more homogeneous and higher T c superconducting films.

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Section: Resultssupporting

confidence: 53%