1998
DOI: 10.1002/(sici)1521-3951(199811)210:1<111::aid-pssb111>3.0.co;2-u
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Effect of Local Lattice Relaxation on the Electronic Structure of Substitutional Donors in Silicon

Abstract: The electronic structure of substitutional group V (P, As and Sb) and group VI (S, Se and Te, both neutral and singly ionized) impurities in silicon has been investigated using self-consistent Multiple Scattering Xa (MSXa) method within the framework of the standard muffin-tin potential approximation, incorporating the effect of lattice relaxation surrounding the impurity. A systematic study of the effect of local lattice relaxation on the electronic structure of group V (shallow) and group VI (deep) donors in… Show more

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Cited by 3 publications
(10 citation statements)
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“…The variation of binding energy with impurity radius is found to be nearly linear for all the impurities under study in both Si 9 and Ge 23. Similar trends have been reported by Li and Myles 7 in their study of S, Se, and Te deep levels in Si based on semiempirical nearest neighbor tight binding model.…”
Section: Resultssupporting
confidence: 88%
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“…The variation of binding energy with impurity radius is found to be nearly linear for all the impurities under study in both Si 9 and Ge 23. Similar trends have been reported by Li and Myles 7 in their study of S, Se, and Te deep levels in Si based on semiempirical nearest neighbor tight binding model.…”
Section: Resultssupporting
confidence: 88%
“…As the impurities assume radii ( r imp) different from that of host atom, the resulting displacements u , of the nearest neighbors are calculated as u = r imp − r host 9 and are given in Table III. Positive u implies that the nearest‐neighbor host atoms move outward, and vice‐versa.…”
Section: Resultssupporting
confidence: 87%
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