Effect of interface morphology on intermetallics formation upon annealing of Al–Ni multilayer

Swain, Mitali; Singh, Surendra; Basu, S.; Gupta, Mukul

doi:10.1016/j.jallcom.2013.04.140

Cited by 24 publications

(12 citation statements)

References 21 publications

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“…Thus for estimation of the stoichiometry of alloy layer we have compared ϕ n (z) obtained from PNR and ϕ x (z) obtained from XRR data with theoretical value of SLD. 19,22 We obtained the stoichiometry of the alloy layer formed at the interface to be NiGe (mono germanide), which corroborates the GIXRD data. We obtained very small magnetic moment density (∼30% of the bulk Ni) for Ni layers in the as-deposited sample from PNR measurements.…”

Section: Resultssupporting

confidence: 81%

“…26 Using XRR and PNR together we identified the interface alloy stoichiometry as reported earlier for the binary systems. 19,22 Surface morphology of the as deposited and annealed samples at 250 • C for 4 h has been quantified in terms of fractal parameters 27,28 of height difference correlation function. The AFM data were collected on samples of 2×2 µm 2 size using a 'Solver P47H' microscope.…”

Section: Experimental and Data Analysismentioning

confidence: 99%

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Micro-structural characterization of low resistive metallic Ni germanide growth on annealing of Ni-Ge multilayer

et al. 2015

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Nickel-Germanides are an important class of metal semiconductor alloys because of their suitability in microelectronics applications. Here we report successful formation and detailed characterization of NiGe metallic alloy phase at the interfaces of a Ni-Ge multilayer on controlled annealing at relatively low temperature ∼ 250 °C. Using x-ray and polarized neutron reflectometry, we could estimate the width of the interfacial alloys formed with nanometer resolution and found the alloy stoichiometry to be equiatomic NiGe, a desirable low-resistance interconnect. We found significant drop in resistance (∼ 50%) on annealing the Ni-Ge multilayer suggesting metallic nature of alloy phase at the interfaces. Further we estimated the resistivity of the alloy phase to be ∼ 59μΩ cm.

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Section: Resultssupporting

confidence: 81%

Section: Experimental and Data Analysismentioning

confidence: 99%

Micro-structural characterization of low resistive metallic Ni germanide growth on annealing of Ni-Ge multilayer

et al. 2015

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“…The PNR data were collected at DHRUVA reactor, India [17]. XRR and PNR are non-destructive tools which provide density profile as a function of depth with nanometer resolutions [18][19][20][21][22]. PNR data allowed us to obtain the nuclear scattering length densities (NSLD) depth profile in the samples and XRR data was used to obtain electron scattering length densities (ESLD).…”

Section: Methodsmentioning

confidence: 99%

Stoichiometry dependent inter diffusion and structural evolution in Al–Ni multilayer

Swain

Singh

Basu

et al. 2015

Journal of Alloys and Compounds

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“…The dissipation of heat through the wire substrates is not as effective as in flat substrates in full contact with the copper substrate-holder. This might be the cause of the presence of "overheated" areas that, in combination with the low reaction temperatures of Ni/Al nanoscale multilayers [15,16], could already locally promote limited reaction during deposition.…”

Section: As-deposited Filmsmentioning

confidence: 99%

Coating of Tungsten Wire with Ni/Al Multilayers for Self-Healing Applications

Ramos

Maj

Morgiel

et al. 2017

Metals

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Self-healing materials are able to partially or completely reverse the damage inflicted on them. The possibility of self-healing mechanical and chemical failures that occur during service will improve the lifetime and reliability of structural materials. For this purpose, two main steps must be considered: (i) detection, and (ii) repairing (healing) of cracks. The exothermic character of reactive multilayers has potential for self-healing applications, namely in the healing step. In this context, Ni(V)/Al multilayer thin films were deposited onto tungsten wires by magnetron sputtering from two targets. A detailed microstructural characterization was carried out by scanning and transmission electron microscopy after deposition, as well as after ignition by applying an electrical discharge. The as-deposited films presented an irregular layered structure with local defects not observed for flat substrates, although Ni-and Al-rich nanolayers could be distinguished. The as-reacted films were constituted by Al 3 Ni 2 grains with Al 3 V phase at the grain boundaries. In order to use reactive multilayers for self-healing purposes, the heat released must be maximised by improving the microstructure of the nanolayered films. Nevertheless, after ignition, the Ni(V)/Al multilayer films deposited onto W wire underwent a self-sustained reaction, releasing heat.

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Effect of interface morphology on intermetallics formation upon annealing of Al–Ni multilayer

Cited by 24 publications

References 21 publications

Micro-structural characterization of low resistive metallic Ni germanide growth on annealing of Ni-Ge multilayer

Micro-structural characterization of low resistive metallic Ni germanide growth on annealing of Ni-Ge multilayer

Stoichiometry dependent inter diffusion and structural evolution in Al–Ni multilayer

Coating of Tungsten Wire with Ni/Al Multilayers for Self-Healing Applications

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