Stoichiometry dependent inter diffusion and structural evolution in Al–Ni multilayer

Swain, Mitali; Singh, Surendra; Basu, S.; Bhattacharya, Debarati; Tokas, R.B.; Gupta, Mukul

doi:10.1016/j.jallcom.2015.01.039

Cited by 9 publications

(7 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The observed acicular morphologies are of vertical type in this study. Similar acicular morphologies were also observed on the surface of as-deposited Ni/Al multilayers examined in study [22] although they have different thickness value from those of the multilayers investigated in this study. Roughness parameters, R a and R q (root mean square), were also calculated during the AFM observation.…”

Section: Resultssupporting

confidence: 84%

“…The main peak was the latter. On the other hand, Ni (222) reflection observed at around 98 • Bragg angle in the XRD pattern of the multilayer in study [22] was not observed in this study. Besides, the peaks observed at around 38 • and 45 • were also detected in the XRD pattern of the as-deposited Al-rich multilayer, 5[Ni(50 Å)/(Al(227 Å)], investigated in study [22].…”

Section: Resultscontrasting

confidence: 81%

“…On the other hand, Ni (222) reflection observed at around 98 • Bragg angle in the XRD pattern of the multilayer in study [22] was not observed in this study. Besides, the peaks observed at around 38 • and 45 • were also detected in the XRD pattern of the as-deposited Al-rich multilayer, 5[Ni(50 Å)/(Al(227 Å)], investigated in study [22]. For Al-rich multilayer in [22], the main peak was Al (111) as observed for the 8[Ni(10 nm)/Al(10 nm)] multilayer investigated in this study.…”

Section: Resultscontrasting

confidence: 81%

“…In other words, this peak was labelled as a mixture of (111) and (200) planes of fcc structure for Ni and Al, respectively. The peaks observed at around 38 • and 45 • in the XRD patterns of the Ni/Al multilayers investigated in the present study were also observed in the XRD pattern of the as-deposited 5[Ni(200 Å)/(Al(100 Å)] multilayer investigated in [22] as Al (111) and Ni(111)/Al(200), respectively. The main peak was the latter.…”

Section: Resultssupporting

confidence: 77%

“…Besides, the peaks observed at around 38 • and 45 • were also detected in the XRD pattern of the as-deposited Al-rich multilayer, 5[Ni(50 Å)/(Al(227 Å)], investigated in study [22]. For Al-rich multilayer in [22], the main peak was Al (111) as observed for the 8[Ni(10 nm)/Al(10 nm)] multilayer investigated in this study. This can be attributed to Al-rich content of the multilayers (see Table I).…”

Section: Resultsmentioning

confidence: 75%

See 4 more Smart Citations

Structural and Corresponding Magnetic Properties of Sputtered Ni/Al Multilayer Films: Effect of Ni Layer Thickness

2018

View full text Add to dashboard Cite

A series of Ni/Al multilayers with different thicknesses of Ni layers was produced by a sputtering technique. The deposition parameters of optimum magnetic properties for write heads were detected by scanning the magnetic layer thickness from 0 to 70 nm. The optimum magnetic properties were decided by obtaining the saturation magnetization, Ms, coercivity, Hc and Ms/Hc ratios from the hysteresis loops. A face centered cubic (fcc) structure was established for all films. Transition surface morphology; i.e., a surface morphology between an apical + uneven structure (observed for the mono layered Al film) and an acicular + relatively smooth structure (observed for the films with Ni layer thicknesses of 30 nm and 70 nm) occurred on the surface of the film with Ni layer thickness of 10 nm. This transition surface morphology was very similar to that of the substrate as compared to the other morphologies and it may lead to relatively lower Hc value. A significant increase in Hc value was detected for Ni/Al film with Ni layer thickness of 70 nm. The increase was attributed to the irregular acicular morphology of substrate and high crystallite size of Al fcc (111). The deposition parameters of 8[Ni(10 nm)/Al(10 nm)] multilayer can be considered in order to support the higher Ms/Hc ratio which has a key role for effective technological applications of write heads.

show abstract

Section: Resultssupporting

confidence: 84%

Section: Resultscontrasting

confidence: 81%

Section: Resultscontrasting

confidence: 81%

Section: Resultssupporting

confidence: 77%

Section: Resultsmentioning

confidence: 75%

See 3 more Smart Citations

Structural and Corresponding Magnetic Properties of Sputtered Ni/Al Multilayer Films: Effect of Ni Layer Thickness

2018

View full text Add to dashboard Cite

show abstract

Investigation of the influence of Al layer and total film thicknesses on structural and related magnetic properties in sputtered Ni/Al multilayer thin films

Kaplan,

Kuru,

Köçkar

2024

J Mater Sci: Mater Electron

View full text Add to dashboard Cite

The effects of parameters of Al layer thickness and total film thickness on the structural and related magnetic properties of Ni/Al multilayer films were investigated. The films were deposited by a dual sputtering. The Ni content decreased gradually while the Al content increased as the Al layer thickness increased. It was also observed that the total film thickness had little effect on the film content. All films have a face-centred cubic structure. And, the surface morphology of Ni/Al films is more uniform and homogeneous than the surface of Ni film. For magnetic analysis, the properties were strongly changed with the parameters. The saturation magnetisation, Ms of Ni film was obtained as 572 emu/cm3 while the Ms of the Ni/Al films decreased from 441 to 298 emu/cm3 with increasing Al content in the films caused by the Al layer thickness. And, the increase of total film thickness resulted in a decrease of Ms value. While the coercivity, Hc value of the Ni film was 90 Oe, Hc of Ni/Al films was decreased to ~ 39 Oe with the formation of multilayer structure. Ni/Al multilayers were obtained magnetically softer than the Ni film. The Ms and Hc values were significantly affected by the variation of the film content and crystal structure caused by the changes in deposition parameters. Therefore, this is a fundamental step for Ni/Al multilayers to improve the properties of these films for their potential applications in microelectronic devices.

show abstract

Low-resistance TiAl3/Au ohmic contact and enhanced performance on AlGaN/GaN HEMT

Xu,

Zhang,

Yang

et al. 2024

Applied Surface Science

View full text Add to dashboard Cite

Stoichiometry dependent inter diffusion and structural evolution in Al–Ni multilayer

Cited by 9 publications

References 26 publications

Structural and Corresponding Magnetic Properties of Sputtered Ni/Al Multilayer Films: Effect of Ni Layer Thickness

Structural and Corresponding Magnetic Properties of Sputtered Ni/Al Multilayer Films: Effect of Ni Layer Thickness

Investigation of the influence of Al layer and total film thicknesses on structural and related magnetic properties in sputtered Ni/Al multilayer thin films

Low-resistance TiAl3/Au ohmic contact and enhanced performance on AlGaN/GaN HEMT

Contact Info

Product

Resources

About