2008
DOI: 10.1080/14786430802375642
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Effect of growth defects on microwave properties in epitaxial Ba0.5Sr0.5TiO3thin films grown on (001) MgO by pulsed laser deposition

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Cited by 9 publications
(3 citation statements)
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References 26 publications
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“…1 have associated the improvement in the dielectric properties to the high structural quality of the as-deposited films while Tse et al . 8 have attributed the increase of 40% in the dielectric tunability to the reduction of 40% in the threading dislocation density due to the post annealing of epitaxial Ba 0.5 Sr 0.5 TiO 3 thin films grown on (001) MgO by pulsed laser deposition.…”
Section: Introductionmentioning
confidence: 99%
“…1 have associated the improvement in the dielectric properties to the high structural quality of the as-deposited films while Tse et al . 8 have attributed the increase of 40% in the dielectric tunability to the reduction of 40% in the threading dislocation density due to the post annealing of epitaxial Ba 0.5 Sr 0.5 TiO 3 thin films grown on (001) MgO by pulsed laser deposition.…”
Section: Introductionmentioning
confidence: 99%
“…Such mechanisms facilitate the nucleation of dislocations in oxide films, which assist the strain relaxation at T dep [68,69]. Note, edge dislocations, uniformly distributed along the entire BST-0.5/LAO interface, and both edge and threading dislocations in BST-0.5/MgO to relieve misfit stresses have been previously observed by high-resolution transmission electron microscopy [70,71]. To estimate the in-plane strains in epitaxial BST-0.5 on single crystal substrates, two assumptions are made, namely, (a) the coefficient of thermal expansions of film and substrate are constant, and (b) additional formation of dislocations during cooling from 720 • C to RT is minimal.…”
Section: Substrate-dependent In-plane Strain In Bst-05 Filmsmentioning
confidence: 69%
“…Apparently, strain fields surrounding the dislocations also enhance the depolarization fields and higher film thicknesses are required for polarization saturation [17]. Indeed, for a 350 nm PLD BST-0.5 film, it has been demonstrated that a reduction in dislocation density, by ex situ annealing in flowing oxygen at 1150 • C for 24 h, has resulted in an increase in permittivity from 870 (as-deposited) to 2000 (annealed) at 20 GHz [71].…”
Section: Factors Influencing Microwave Dielectric Responses Of Bst-05...mentioning
confidence: 99%