2015 10th European Microwave Integrated Circuits Conference (EuMIC) 2015
DOI: 10.1109/eumic.2015.7345107
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Effect of gate field plate and Γ(gamma)-gate structures on RF power performance of AlGaN/GaN HEMTs

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Cited by 4 publications
(4 citation statements)
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“…The Γ-gate structure is effective in controlling the electric field to make the G m curve flatter because of the gate field plate. 30 The relationships between G m′′ and OIP3, G m are shown in Eq. 3.…”
Section: Resultsmentioning
confidence: 99%
“…The Γ-gate structure is effective in controlling the electric field to make the G m curve flatter because of the gate field plate. 30 The relationships between G m′′ and OIP3, G m are shown in Eq. 3.…”
Section: Resultsmentioning
confidence: 99%
“…Finally, Ti/Au metal stack with a total thickness of 3m had been deposited as an interconnection using e-beam evaporation. The details of the fabrication,DC and RF performance comparison of the fabricated devices were given in [3].…”
Section: Fabrication Technologymentioning
confidence: 99%
“…Finally, Ti/Au metal stack with a total thickness of 3m had been deposited as an interconnection using e-beam evaporation. The details of the fabrication,DC and RF performance comparison of the fabricated devices were given in [3]. In order to observe the transistor performance; DC characterization, small signal and large signal characterizations were performed respectively for 8x125μm HEMT device which has 3μm drain-source spacing.…”
Section: Fabrication Technologymentioning
confidence: 99%