Effect of gas-timing technique on structure and optical properties of sputtered zinc oxide films

Influence of thickness and coatings morphology in the antimicrobial performance of zinc oxide coatings

“…In XRD patterns it is observed the presence of the (0 0 2) diffraction peak of the ZnO wurtzite structure (JPCDS36-1451 [17]) in all the samples, indicating a preferential orientation to the c-axis perpendicular to the substrate, as previously reported by others authors [18,19]. Some authors correlate the preferential orientation with the minimization of internal stress and surface energy [20,21] and others [22] reported that c-orientation maybe result from the highest atomic density found along (0 0 2) plane.…”

Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

“…At sputter power of 200 W, the grown nanowires and nanotubes were larger with improvement in the surface density. The more energetic sputtered particles may induce higher surface roughness [24].…”

“…The average optical transmittance of ZnO films observed was 90% in the visible wavelength range. The optical transmittance decreased with increase of sputter power due to increased scattering reflection and absorption by the films, owing to larger surface roughness of the films deposited at higher sputter power [24]. The optical absorption edge shifted to higher wavelength side with increase of sputter power from 100 to 200 W. The absorption coefficient (α) of the films was calculated from the optical transmittance (T) data and thickness (t) of the film using the relation …”

Texture orientation of silver thin films grown via gas-timing radio frequency magnetron sputtering and their SERS activity

“…Recently, Jiti et al established special techniques that are available to adjust chemical composition and obtain high quality crystalline in thin lms by controlling the on-off ow sequence of sputtering gas so called gastiming (GT) and reactive gas-timing (RGT) techniques. [18][19][20][21][22][23][24][25] Another major advantage of these techniques is the change in structure coupled with high quality crystalline thin lm which could be achieved at room temperature and without applying any external energy source. [18][19][20][21][22][23][24][25] Here we demonstrate the texture engineering of sputtered Ag thin lms through GT rf magnetron sputtering.…”

“…[18][19][20][21][22][23][24][25] Another major advantage of these techniques is the change in structure coupled with high quality crystalline thin lm which could be achieved at room temperature and without applying any external energy source. [18][19][20][21][22][23][24][25] Here we demonstrate the texture engineering of sputtered Ag thin lms through GT rf magnetron sputtering. The dependence of RF power, working pressure and on-off gas sequence on the peak intensity of (111)/(200) ratio was investigated.…”