Effect of functional groups on condensation and properties of sol–gel silica nanoparticles prepared by direct synthesis from organoalkoxysilanes

Dirè, Sandra; Tagliazucca, Valeria; Callone, Emanuela; Quaranta, A.

doi:10.1016/j.matchemphys.2010.12.015

Cited by 38 publications

(31 citation statements)

References 44 publications

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“…aminopropyl-, cyanoethyl, vinyl-). The reactivity of the silane towards the substrate is influenced by the hydrolysis rate of the alkoxy groups [4][5], and the catalytic activity of the functional side chain [6][7][8]. The presence of other catalysts like water, acid or base usually fastens the rate of the hydrolysis and/or the condensation [9][10][11][12][13].…”

mentioning

confidence: 99%

Preparation, purification, and characterization of aminopropyl-functionalized silica sol

Pálmai

Nagy

Mihály

et al. 2013

Journal of Colloid and Interface Science

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A new, simple and "green" method was developed for the surface modification of 20 nm diameter Stöber silica particles with 3-aminopropyl(diethoxy)methylsilane in ethanol. The bulk polycondensation of the reagent was inhibited and the stability of the sol preserved by adding a small amount of glacial acetic acid after appropriate reaction time. Centrifugation, ultrafiltration and dialysis were compared in order to choose a convenient purification technique that allows the separation of unreacted silylating agent from the nanoparticles without destabilizing the sol. The exchange of the solvent to acidic water during the purification yielded a stable colloid, as well. Structural and morphological analysis of the obtained aminopropyl silica was performed using transmission electron microscopy (TEM), dynamic light scattering (DLS) and zeta potential measurements, Fourier-transform infrared (FTIR), 13 C and 29 Si MAS nuclear magnetic resonance (NMR) spectroscopies, as well as small angle X-ray scattering (SAXS). Our investigations revealed that the silica nanoparticle surfaces were partially covered with aminopropyl groups, and multilayer adsorption followed by polycondensation of the silylating reagent was successfully avoided. The resulting stable aminopropyl silica sol (ethanolic or aqueous) is suitable for biomedical uses due to its purity.

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mentioning

confidence: 99%

Preparation, purification, and characterization of aminopropyl-functionalized silica sol

Pálmai

Nagy

Mihály

et al. 2013

Journal of Colloid and Interface Science

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“…However, this simple one-step base-catalyzed sol-gel process using TEOS and MTES system has long been neglected. MTES is one of commonly used trifunctional organosilanes as a single precursor or a co-precursor with TEOS to prepare AR coatings and investigate the hydrolysis kinetics [32] and the effect of pendant groups [33]. It is noteworthy that the rate of MTES hydrolysis is much higher than its condensation due to the steric hindrance effect [19].…”

Section: Particle Growth Mechanismmentioning

confidence: 99%

“…However, a lower or higher refractive index will result in a coating with lower transmittance. Here, the refractive indices of the thin films were measured using spectroscopic ellipsometry in reflection mode and porosities of the films were calculated from the refractive index-porosity equation, i.e., by comparing the porous films with nonporous reference thin films [33]. Figure 6, S3, and S4 show ellipsometry results for the coatings.…”

Section: The Refractive Indices and Ar Properties Of Thin Filmsmentioning

confidence: 99%

Sol–gel preparation of moisture-resistant antireflective coatings from novel hollow silica nanoparticles

Tao

Yan

Yuan

et al. 2016

J Sol-Gel Sci Technol

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In this study, a simple approach was developed to prepare hollow silica nanoparticles (HSNs) sols via a one-step base-catalyzed sol-gel process using methyltriethoxysilane and tetraethoxysilicate as co-precursors. The prepared sols were suitable for large-area processing with ease of antireflective (AR) coating and being directly applicable without requiring any pre-or post-treatment. AR coatings were dip coated on K9 glasses from these sols. Furthermore, AR coatings were intrinsically hydrophobic with static water contact angles up to 126.5°on the smooth K9 glass. A particle growth mechanism of the hybrid HSNs was proposed, and the relationship between the microstructure of HSNs and the properties of AR coatings was investigated. These AR coatings with relatively excellent AR properties and improved moisture resistance were useful in solar cells, low-cost electronics, and optical devices. Graphical Abstract

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“…Most of the functional resist, such as sol-gel solution [61][62][63][64][65][66], nanoparticle-dispersed solution [67][68][69][70][71][72][73], metal nano-ink [74][75][76][77][78], spin-on-glass (SOG) resist [79][80][81][82], are formulated by mixing precursors or nanoparticles in an organic solvent. To fabricate nanostructures consisting of functional materials by NIL, the solvent in the functional resist and gas products generated from hydrolysis-condensation reaction [83][84][85][86] should be removed during the NIL process. Also, the surface energy of the mold should be small enough for easy detachment between the mold and the functional resist.…”

Section: Process Types Of Direct Nil Using Functional Resistsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Effect of functional groups on condensation and properties of sol–gel silica nanoparticles prepared by direct synthesis from organoalkoxysilanes

Cited by 38 publications

References 44 publications

Preparation, purification, and characterization of aminopropyl-functionalized silica sol

Preparation, purification, and characterization of aminopropyl-functionalized silica sol

Sol–gel preparation of moisture-resistant antireflective coatings from novel hollow silica nanoparticles

Recent progress in direct patterning technologies based on nano-imprint lithography

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