Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films

Lou, Hongbo; Axén, N.; Somekh, R.E.; Hutchings, IM

doi:10.1016/s0257-8972(96)03104-0

Cited by 22 publications

(14 citation statements)

References 8 publications

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“…There exist Monte Carlo-binary collision codes (e.g. SRIM [7], TRIM [8], MARLOWE [9]) and molecular dynamics codes (e.g. the work of Harrison [10]).…”

Section: Sputter Yieldmentioning

confidence: 99%

“…In chapter II, it was described that a film characterized by V-shaped columns, terminated by a faceted column top and exhibiting a clear out-of-plane alignment originating from an overgrowth mechanism is deposited in zone T conditions (see table II.5). [10][11][12][13], increasing substrate temperature [9,14,15] or increasing ion-to-atom ratio [16,17] has been observed. Also the influence of the ion energy on the out-of-plane orientation has been investigated [10,[18][19][20][21].…”

Section: : Experimental Observations: Tinmentioning

confidence: 99%

“…A lot of authors who also developed a model to simulate the sputtered flux used an energy independent nascent angular distribution according to the cosinus-law derived by Sigmund and the energy distribution according to the Thompson law [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18]. As well as the cosinus-law derived by Sigmund as the energy distribution according to the Thompson law has been described in detail in chapter III.…”

Section: Energy and Directionmentioning

confidence: 99%

“…Beside the mobility also other parameters such as the deposition rate, impurities, energetic bombardment,… were mentioned to influence the film growth and its final structure. The influence of all these parameters on the structural features that develop in the deposited films were depicted in terms of structure zone models (SZM's) by many authors [2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18]. At first, the basic structure zone model (BSZM) will be described.…”

Section: : Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Biaxial alignment in sputter deposited thin films

et al. 2006

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“…There exist Monte Carlo-binary collision codes (e.g. SRIM [7], TRIM [8], MARLOWE [9]) and molecular dynamics codes (e.g. the work of Harrison [10]).…”

Section: Sputter Yieldmentioning

confidence: 99%

Section: : Experimental Observations: Tinmentioning

confidence: 99%

Section: Energy and Directionmentioning

confidence: 99%

Section: : Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Biaxial alignment in sputter deposited thin films

et al. 2006

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“…Mostly one reactive gas is used for the deposition. Some examples for often deposited nitride coatings are CrN [1], TiN [2], ZrN [3], TiAlN [4] or CrAlN [5]. But there are also several examples where two reactive gases are introduced in the vacuum chamber during deposition, e.g.…”

Section: Introductionmentioning

confidence: 99%

Precise control of multilayered structures of Nb–O–N thin films by the use of reactive gas pulsing process in DC magnetron sputtering

Fenker

Kappl

Sandu

2008

Surface and Coatings Technology

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Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

Kirchner¹,

Hallmeier²,

Szargan³

et al. 2007

Electroanalysis

125

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Titanium nitride is a hard and inert conducting material that has yet not been widely used as electrode material for electroanalytical applications although there are highly developed protocols available to produce well adherent micro and nanostructured electrodes. In this paper the possibilities of using titanium nitride thin films for electroanalytical applications is investigated. Scanning electrochemical microscope (SECM) was used for analysis of the redox kinetics of a selected fast redox couple at thin films of titanium nitride (TiN) in different thicknesses. The investigation was carried out by approaching an amperometric ultramicroelectrode (UME) to the TiN film while the soluble redox couple (ferrocenemethanol/ferrociniummethanol) served as mediator in a SECM configuration. The substrate was biased at a potential so that it rereduces the species being produced at the UME, thus controlling the feedback effect. Normalized current -distance curves were fitted to the theoretical model in order to find the apparent heterogeneous standard rate constant (k8) at the sample. The data are further supported by structural investigation of the TiN films using scanning force microscopy and X-ray photoelectron spectroscopy. It was found that the kinetics are little influenced by prolonged storage in air. The heterogeneous standard rate constants in 2 mM ferrocenemethanol were (0.73 AE 0.05) Â 10 À3 cm s À1 for 20 nm TiN thin layer, (1.5 AE 0.2) Â 10 À3 cm s À1 for 100 nm TiN thin layer and (1.3 AE 0.2) Â 10 À3 cm s À1 for 300 nm TiN thin layer after prolonged storage in air. Oxidative surface treatment (in order to remove organic adsorbates) decreased the kinetics in agreement with a thicker oxide layer on the material. The results suggest that their direct use for amperometric detection of reversible redox systems in particular at miniaturized configurations may be advantageous.

show abstract

Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films

Cited by 22 publications

References 8 publications

Biaxial alignment in sputter deposited thin films

Biaxial alignment in sputter deposited thin films

Precise control of multilayered structures of Nb–O–N thin films by the use of reactive gas pulsing process in DC magnetron sputtering

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

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