Effect of corona discharge on formation of holographic diffraction gratings in the Cu–As2Se3 thin-film structure

Effect of Corona Discharge on the Optical Properties of Thin-Film Cu–As2Se3 Structures

“…As in work [11], these results can be easily explained within a known photoelectrical model [4,13]. This model assumes that the photodiffusion rate is limited by the rate of metal permeation from the doped region of an SCG material into the undoped one.…”

“…Figure 1 shows the variations of diffraction efficiency with exposition for holographic diffraction gratings with a spatial frequency of 500 mm −1 fabricated using both conventional (curves 2, 5) and corona discharge-assisted (curves 1, 3, 4) recording methods (note that a similar figure can be found in [11]). As can be seen, with negative corona discharge, the sensitivity of Cu-As 2 Se 3 structure was enhanced and the diffraction efficiency of inscribed gratings was raised (compare curves in pairs 1, 2 and 4, 5).…”

“…For a metal-SCG structure, a recording method in which exposition was carried out simultaneously with inscription using corona discharge was proposed in [5]. With this method, the sensitivity, diffraction efficiency, and relief depth produced using chemical etching [6] due to the LIST [7][8][9] and LIMD [10,11] effects were increased by several times. We note that the effect of corona discharge is more emphasized in thin SCG layers.…”