Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr–Si–N Films

Chen, Yung-I; Zheng, Yu‐Zhe; Chang, Li-Chun; Liu, Yuheng

doi:10.3390/ma12172658

Cited by 4 publications

(3 citation statements)

References 43 publications

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“…Mahato et al [15] reported changes in crystalline phases and grain size following the adjustment of nitrogen content. Applying a negative bias voltage to the substrate has been shown to increase the kinetic energy of the bombarding positive ions, which increases the adatom mobility (ion-bombardment-enhanced diffusion), re-sputtering, and atomic peening [16]. Biswas et al [17] reported that higher bias voltages tend to improve the density of thin films by enhancing the intensity of ion bombardment, however, excessively high bias voltages can compromise the mechanical properties.…”

Section: Introductionmentioning

confidence: 99%

Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films

et al. 2020

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This study deposited CrAlN coatings from Al50Cr50 targets using high-power impulse magnetron sputtering, with a focus on the effects of nitrogen content and substrate bias voltage on the deposition rate, microstructure, crystal orientation, residual stress, and mechanical properties of the coating. The nitrogen content was adjusted by varying the N2/Ar flow ratio between 20% and 140%. Increasing the nitrogen flow rate during deposition led to corresponding decreases in the deposition rate and film thickness. X-ray diffractometer (XRD) analysis revealed that a low N2/Ar flow ratio (<40%) resulted in amorphous CrAlN, whereas a higher ratio (>40%) resulted in an face-centered cubic (FCC) phase. Bias voltage also had considerable influence on the residual stress and grain size. A refined grain structure and high internal stress resulted in hard CrAlN coatings. Among the various parameter combinations evaluated in this study, the highest hardness (35.4 GPa) and highest elastic modulus (426 GPa) were obtained using an N2/Ar flow ratio of 100% and a bias voltage of −120 V.

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Section: Introductionmentioning

confidence: 99%

Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films

et al. 2020

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“…In recent years, high power impulse magnetron sputtering (HIPIMS), as an alternative to di-rect current magnetron sputtering (DCMS), has attracted extensive attention from many re-searchers and the industry (Purandare et al, 2020;Chen et al, 2019). It utilizes high peak target power and extremely low duty cycle to generate high-density plasma and highly ionized sputtered particles to improve the microstructure and mechanical properties of coatings (Badini et al, 2019;Wu et al, 2019).…”

Section: Introductionmentioning

confidence: 99%

Microstructure Evolution of Tin Coatings Prepared by Dual-Pulse Power Magnetron Sputtering

Yang,

Hao,

Wang

et al. 2023

Smart Manufacturing and Material Processing (SMMP)

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The type of power source and the deposition parameters directly determine the growth structure of the coating during the magnetron sputtering, resulting in the difference of the mechanical properties of the coating. High power impulse magnetron sputtering (HIPIMS) generates high-density plasma by high power pulsed power source, which leads to the coating with dense structure and excellent mechanical properties. However, the low deposition rate of HIPIMS reduces the coating preparation efficiency and affects its industrial application. Therefore, dual-pulse power magnetron sputtering technology has been developed to improve the deposition rate and quality of coatings. In this study, TiN coatings were prepared using DPPMS at different deposition times. The microstructure, deposition rate, residual stress and adhesion of TiN coatings were analyzed. The results showed that when only one target was used for deposition, the deposition rate of TiN coatings increased first and then decreased during the coating growth. When the deposition time was 80 min, the deposition rate reached the maximum value of 52 nm/min. After the deposition time of 80 min, the residual stress in the TiN coatings changed from compressive stress to tensile stress, resulting in a significant decrease in the deposition rate of TiN coatings. The microstructure of TiN coatings gradually changed from fibrous structure to dense columnar structure with the prolongation of deposition time. In addition, when the deposition time was 80 min, the TiN coating had low residual compressive stress (-0.2 GPa), high hardness (27.5 GPa) and elastic modulus (340 GPa), and excellent adhesion between the coating and the substrate.

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“…Bias sputtering increased the kinetic energy of charged ions, which enhanced the mobility of sputtered species and resulted in re-sputtering and atomic peening [26][27][28]. The re-sputtering of light adatoms could affect the atomic compositions of M-Si-N films [29,30]. Therefore, this study investigated variations in the mechanical properties and wear resistance of sputtered W-N and W-Si-N films by adjusting the nitrogen flow ratio and substrate bias.…”

Section: Introductionmentioning

confidence: 99%

Effects of the Nitrogen Flow Ratio and Substrate Bias on the Mechanical Properties of W–N and W–Si–N Films

et al. 2020

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The reactive gas flow ratio and substrate bias voltage are crucial sputtering parameters for fabricating transition metal nitride films. In this study, W–N films were prepared using sputtering with nitrogen flow ratios (f) of 0.1–0.5. W–N and W–Si–N films were then prepared using an f level of 0.4 and substrate bias varying from 0 to −150 V by using sputtering and co-sputtering, respectively. The variations in phase structures, bonding characteristics, mechanical properties, and wear resistance of the W–N and W–Si–N films were investigated. The W–N films prepared with nitrogen flow ratios of 0.1–0.2, 0.3, and 0.4–0.5 displayed crystalline W, amorphous W–N, and crystalline W2N, respectively. The W–N films prepared using a nitrogen flow ratio of 0.4 and substrate bias voltages of −50 and −100 V exhibited favorable mechanical properties and high wear resistance. The mechanical properties of the amorphous W–Si–N films were not related to the magnitude of the substrate bias.

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Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr–Si–N Films

Cited by 4 publications

References 43 publications

Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films

Influence of Nitrogen Content and Bias Voltage on Residual Stress and the Tribological and Mechanical Properties of CrAlN Films

Microstructure Evolution of Tin Coatings Prepared by Dual-Pulse Power Magnetron Sputtering

Effects of the Nitrogen Flow Ratio and Substrate Bias on the Mechanical Properties of W–N and W–Si–N Films

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