Effect of Atmosphere During Deposition on the Morphology, Mechanical Properties and Microfriction of Zr-Based Coatings

Кузнецова, Т. А.; Lapitskaya, V. A.; Чижик, С. А.; Warcholiński, B.; Gilewicz, A.

doi:10.1007/978-3-030-81705-3_16

Cited by 1 publication

(3 citation statements)

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“…Based on the surface adhesion force values [26], the specific surface energy γ was determined [27]: The study of the structure, roughness and adhesion force of the film surface before and after rapid thermal treatment was carried out using an atomic force microscope Dimension FastScan (Bruker, Santa Barbara, CA, USA) in PeakForce QNM mode (Quantitative Nanoscale Mechanical Mapping, Bruker, Santa Barbara, CA, USA). Standard silicon cantilevers of the CSG10_SS type (TipsNano, Moscow, Russia) with a curvature radius of 3.2 nm and a cantilever stiffness of 0.26 N/m were used.…”

Section: Methodsmentioning

confidence: 99%

“…where R S is the surface resistance of the sample, Ω/square; t is the thickness of the nickel film on silicon after heat treatment, meter. The rapid thermal treatment temperature was a criterion for correlation analysis [27]. The relationship between two parameters (roughness, specific surface energy, grain size and specific electrical resistivity) with respect to the third constant feature-rapid thermal treatment temperature-was found.…”

Section: Methodsmentioning

confidence: 99%

“…The relationship between two parameters (roughness, specific surface energy, grain size and specific electrical resistivity) with respect to the third constant feature-rapid thermal treatment temperature-was found. The correlation coefficient of parameters x and y was found by the formula [27]:…”

Section: Methodsmentioning

confidence: 99%

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Microstructure and Properties of Thin-Film Submicrostructures Obtained by Rapid Thermal Treatment of Nickel Films on Silicon

Lapitskaya,

Trukhan,

Kuznetsova

et al. 2024

Surfaces

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Nickel films of 40 nm thickness were obtained by means of magnetron sputtering on a single-crystalline silicon substrate. The films were subjected to rapid thermal treatment (RTT) for 7 s until the temperature increased from 200 to 550 °C. By means of the X-ray diffraction method, the structural-phase composition of nickel films before and after RTT was explored. The atomic force microscopy method due to direct contact with the surface under study, made it possible to accurately define the microstructure, roughness, specific surface energy and grain size of the nickel films before and after RTT, as well as to establish the relationship of these parameters with the phase composition and electrical properties of the films. Surface specific resistance was measured using the four-probe method. Based on XRD results, formation of Ni2Si and NiSi phases in the film was ascertained after RTT at 300 °C. At RTT 350–550 °C, only the NiSi phase was formed in the film. The microstructure and grain size significantly depend on the phase composition of the films. A correlation has been established between specific surface energy and resistivity with the average grain size after RTT at 350–550 °C, which is associated with the formation and constant restructuring of the crystal structure of the NiSi phase.

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Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%