2015
DOI: 10.7567/apex.9.012103
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Effect of anode buffer layer on the efficiency of inverted quantum-dot light-emitting diodes

Abstract: The impact of anode buffer layers (ABLs) on the performance of CdSe quantum-dot light-emitting diodes (QLED) with a ZnO nanoparticle (NP) electron-transport layer and 4,4′-cyclohexylidenebis[N,N-bis(4-methylphenyl)benzenamine] (TAPC) hole-transport layer was studied. Either MoO3 or 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile (HAT-CN) was used as the ABL. The QLED with a HAT-CN ABL exhibited better luminance performance, while the ultraviolet photoelectron spectroscopy and hole-only devices indicated that… Show more

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Cited by 15 publications
(11 citation statements)
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“…If MoO 3 is completely replaced with HATCN (i.e., in D4), the leakage current increases such that the luminance and current efficiency decrease drastically, illustrating the poor charge injection capability of HATCN compared with MoO 3 when used alone as the charge injection material. 32,33 Therefore, it can be clearly seen that the improvements in device performances brought by the insertion of HATCN indeed mainly originate from its passivation effect on the underlying CBP layer. The passivation effect of HATCN is effective on not only CBP but also other organic hole transport layers that are vulnerable to thermal damages.…”
Section: Resultsmentioning
confidence: 99%
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“…If MoO 3 is completely replaced with HATCN (i.e., in D4), the leakage current increases such that the luminance and current efficiency decrease drastically, illustrating the poor charge injection capability of HATCN compared with MoO 3 when used alone as the charge injection material. 32,33 Therefore, it can be clearly seen that the improvements in device performances brought by the insertion of HATCN indeed mainly originate from its passivation effect on the underlying CBP layer. The passivation effect of HATCN is effective on not only CBP but also other organic hole transport layers that are vulnerable to thermal damages.…”
Section: Resultsmentioning
confidence: 99%
“…Nevertheless, D3 still exhibits considerably higher CE than D2 at high current injection, with an enhancement factor of 18% for the maximum CE. If MoO 3 is completely replaced with HATCN (i.e., in D4), the leakage current increases such that the luminance and current efficiency decrease drastically, illustrating the poor charge injection capability of HATCN compared with MoO 3 when used alone as the charge injection material. , Therefore, it can be clearly seen that the improvements in device performances brought by the insertion of HATCN indeed mainly originate from its passivation effect on the underlying CBP layer.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The mismatch in electron and hole injection efficiency inevitably leads to a charge imbalance within QDLEDs and an accumulation of holes in the HTL in the immediate vicinity of its interface with the QD layer, a phenomenon which is believed to be one of the main contributors to poor efficiency and degradation via nonradiative Auger recombination. The MoO 3 HIL is commonly used in organic and QDLEDs because of its very deep Fermi level, allowing for better hole injection into HTLs with deep HOMO energy levels such as CBP . In contrast, the CHTL devices allow for the utilization of a wider variety of alternate HILs including those with shallower energy levels, such as HATCN, which would otherwise be difficult to use in order to avoid a large hole injection barrier at the HTL/HIL interface.…”
Section: Results and Discussionmentioning
confidence: 99%
“…Quantum dot light emitting diode (QLED) displays, as the most promising next-generation LED display, have attracted a lot of attention due to their stable optical performance, narrow spectral emission bandwidths, and high screen resolution. As the emitting layer, the quantum dot (QD) film plays an important role in determining the performance of QLED devices. Generally, the performance of the QD film depends on both the physicochemical property of QDs themselves and the quality of the assembled film, particularly the uniformity and the thickness. A QD film with suitable thickness is always preferred for efficient charge transfer across the film . In particular, the surface roughness of the QD film affects both its charge-transport behavior and the charge balance with the neighboring layer in the multilayered device, which affects the quantum efficiency directly.…”
Section: Introductionmentioning
confidence: 99%