Effect of annealing on the laser induced damage of polished and CO2 laser-processed fused silica surfaces

Doualle, Thomas; Gallais, Laurent; Cormont, Philippe; Donval, Thierry; Lamaignère, Laurent; Rullier, Jean-Luc

doi:10.1063/1.4953146

Cited by 18 publications

(9 citation statements)

References 50 publications

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“…The silica surfaces were annealed when needed using a laboratory muffle furnace, under ambient atmosphere. Given that the glass transition temperature of fused silica is equal to 1200 °C, a peak temperature of 1050 °C was chosen for annealing . The samples were placed in a porcelain high temperature crucible and heated from room temperature to 1050 °C within 3 h (5.7 °C/min).…”

Section: Methodsmentioning

confidence: 99%

Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism

et al. 2022

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From atomic force microscopy (AFM) experiments, we report a new phenomenon in which the dissolution rate of fused silica is enhanced by more than 5 orders of magnitude by simply pressing a second, dissimilar surface against it and oscillating the contact pressure at low kHz frequencies in deionized water. The silica dissolution rate enhancement was found to exhibit a strong dependence on the pressure oscillation frequency consistent with a resonance effect. This harmonic enhancement of the silica dissolution rate was only observed at asymmetric material interfaces (e.g., diamond on silica) with no evidence of dissolution rate enhancement observed at symmetric material interfaces (i.e., silica on silica) within the experimental time scales. The apparent requirement for interface dissimilarity, the results of analogous experiments performed in anhydrous dodecane, and the observation that the silica “dissolution pits” continue to grow in size under contact stresses well below the silica yield stress refute a mechanical deformation or chemo-mechanical origin to the observed phenomenon. Instead, the silica dissolution rate enhancement exhibits characteristics consistent with a previously described ‘electrochemical pressure solution’ mechanism, albeit, with greatly amplified kinetics. Using a framework of electrochemical pressure solution, an electrochemical model of mineral dissolution, and a recently proposed “surface resonance” theory, we present an electro-chemo-mechanical mechanism that explains how oscillating the contact pressure between dissimilar surfaces in water can amplify surface dissolution rates by many orders of magnitude. This reaction rate enhancement mechanism has implications not only for dissolution but also for potentially other reactions occurring at the solid–liquid interface, e.g. catalysis.

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Section: Methodsmentioning

confidence: 99%

Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism

et al. 2022

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“…This rapid cooling results in an increase of the glass volume in the heat affected area and surface deformations on the glass surface in the form of bumps 6,30,31 . However the fused silica glasses exhibit the opposite effect: an increase of the glass density leading to surface deformation in the form of depressions within the laser-irradiated area 6,26 . In order to estimate these modifications we have implemented in the numerical model the calculation of fictive temperature (T f ), which characterizes the structural state of the glass.…”

Section: B Heat Affected Zonementioning

confidence: 99%

“…Vignes et al 23 estimated x=0.9 in conditions of CO 2 laser heating. In our previous work 33 we have estimated a value of ∆H=457 kJ/mol, with x= 1 obtained from fitting experimental data.…”

Section: B Heat Affected Zonementioning

confidence: 99%

“…Their model is able to describe nanometric surface profile changes related to structural modifications (densification) and the development of residual stresses, with excellent agreement between experiment and simulations in the long pulse regime (seconds). We have also detailed the development of comprehensive thermo-mechanical numerical simulations of these physical processes, based on finite-element method 24 , with choice of the different inputs parameters based on dedicated experiments: infrared thermography, optical profilometry, furnace annealing, photo-elastimetry or wavefront propagation measurements [25][26][27] . In the continuation of this work, we present in this paper our last progress in the improvement of the description of the laser material interactions under consideration.…”

Section: Introductionmentioning

confidence: 99%

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Experimental and numerical investigation of CO2 laser ablation of fused silica with sub-microsecond pulses

Quintal

Cormont

Gallais

2021

Journal of Applied Physics

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The CO2 laser material interaction is commonly used for thermal treatments and processing of fused silica glasses. As the laser pulse duration decreases down to a few tens of microseconds, the heat-affected depth in the material decreases up to the point where it has the same magnitude as the laser radiation penetration depth, which is an interesting operating point for applications that require minimal heat-affected zone. In this work, we explore the effects of CO2 laser pulses in the range of 100 μs to a few milliseconds on the laser ablation of polished fused silica surfaces, based on experiments and numerical simulations. We particularly study the evolution of surface profile as a function of the number of applied pulses. The results suggest that the ablation depth can be accurately controlled from a few hundreds of nanometers to a few tens of micrometers by adjusting the combination of the number of applied pulses and pulse duration.

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“…Some investigations demonstrated that the LIDT may return to the normal level or higher after CO 2 laser treatment [7,8]. Although there have been some reports on the optical and mechanical effects of CO 2 laser treatment for scratches and laser-induced damage sites on the surface of fused silica, as well as the physical model of the secondary treatment or annealing process to eliminate residual stress [9,10], there is no report about the evolution of defects on the fused silica surface during this process.…”

Section: Introductionmentioning

confidence: 99%

Correlation between Photoluminescence Properties of Surface Defects and Laser-Induced Damage Threshold of Fused Silica

et al. 2021

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Laser-induced damage threshold is the main limitation for fused silica optics in high-power laser applications. The existence of various defects near the surface is the key factor for the degradation of the threshold. In this work, the photoluminescence spectra at different regions of the damaged and recovered fused silica samples are recorded to analyze the correlation between photoluminescence of surface defects and laser-induced damage threshold. The experimental data concluded the inverse proportional correlation between fluorescence and laser-induced damage threshold value. The weak photoluminescence is the guarantee of the high laser-induced damage threshold, and then the higher local Si nanocluster concentration corresponds with the higher laser-induced damage threshold value for the fused silica optics after CO2 laser treatment. The investigation reveals that photoluminescence measurement can be employed to check the quality of pristine fused silica and evaluate the tendency of the laser-induced damage threshold value. The current results are helpful for understanding the evolution of interaction from CO2 laser treatment and fused silica optics and can provide the guide of process technology for the high quality of fused silica optics.

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Effect of annealing on the laser induced damage of polished and CO2 laser-processed fused silica surfaces

Abstract: International audienc

Cited by 18 publications

References 50 publications

Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism

Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism

Experimental and numerical investigation of CO2 laser ablation of fused silica with sub-microsecond pulses

Correlation between Photoluminescence Properties of Surface Defects and Laser-Induced Damage Threshold of Fused Silica

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