2007
DOI: 10.1051/epjap:2007137
|View full text |Cite
|
Sign up to set email alerts
|

Effect of annealing on In2S3thin films prepared by flash evaporation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
9
0

Year Published

2012
2012
2024
2024

Publication Types

Select...
10

Relationship

0
10

Authors

Journals

citations
Cited by 17 publications
(13 citation statements)
references
References 23 publications
2
9
0
Order By: Relevance
“…It is found to be varied with film thickness which may be attributed to the allowed states in the forbidden region revealed an improvement in the uniformity of the films [44]. Generally, band gap has tendency toward lower side as thickness increases owing to the optical band gap narrowness between the defect levels and the conduction band [45]. The results are in agreement with the earlier reported work [46,47].…”
Section: Optical Analysissupporting
confidence: 87%
“…It is found to be varied with film thickness which may be attributed to the allowed states in the forbidden region revealed an improvement in the uniformity of the films [44]. Generally, band gap has tendency toward lower side as thickness increases owing to the optical band gap narrowness between the defect levels and the conduction band [45]. The results are in agreement with the earlier reported work [46,47].…”
Section: Optical Analysissupporting
confidence: 87%
“…Consequently, the films contain sulfur rich at higher annealing temperatures. Bouabid et al (Bouabid et al, 2007) also observed S/In value of 1.67 for In 2 S 3 films anealed at 573 K under sulfur atmosphere.…”
Section: Crystal Structurementioning
confidence: 84%
“…No voids and inclusions are found. The surface is appeared to be regular and after annealing at 150 1C a slight roughness is also observed which indicates to the more reallignment in orientation of the deposited atoms of films [45]. Generally, the grains in the films depended on the annealing temperature, substrate temperature and film thickness.…”
Section: Surface Morphological and Compositional Analysismentioning
confidence: 95%