Abstract:A mixed paste of aluminum (Al) and germanium (Ge) (7:3) was prepared and screen-printed on silicon (Si) substrates, followed by annealing at a peak temperature of 1000 °C in an infrared rapid thermal annealing furnace to investigate the liquid-phase growth of silicon-germanium (SiGe) epitaxial layers. The gas ambient during annealing was changed to investigate the effect on SiGe layer quality and physical properties. The SiGe-formed samples were observed by scanning electron microscopy (SEM) and energy-dispers… Show more
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