“…It has been reported that the intensity of X-ray reflections from Ti 1−x Al x N films with 0.59 ≤ x Al ≤ 0.86 is very weak due to the formation of nanometer-sized grains and low-density interfaces, confirming the formation of nanostructures in the films at these specific composition of Al. The phase transformation in Ti 1−x Al x N films with varying Al content, has been well studied in the literature [19][20][21][22][23]. However, structure and properties of the Ti 1−x Al x N films reported so far are widely different due to the different processing conditions chosen during deposition.…”