Effect of air annealing on mechanical properties and structure of amorphous B4C films

Kulikovsky, V.; Vorlı́ček, V.; Čtvrtlík, Radim; Boháč, P.; Jastrabı́k, L.; Lapšanská, Hana

doi:10.1016/j.surfcoat.2011.02.052

Cited by 15 publications

(8 citation statements)

References 17 publications

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“…From this analysis, it is clear that deposition pressure is a key parameter allowing the microstructure and the morphology of the LMNO films to be tailored while keeping the thin film strongly adhesive on the substrate. The stress of the sputtered LMNO thin films has been reduced after the annealing process as already observed in refs and on other thin film materials (B 4 C, W), probably owing to the formation of voids within the thin films as depicted on the SEM cross sections shown in Figure or due to the crystallization process. Subsequently, an in-depth study dealing with the influence of the pressure on LMNO structural and electrochemical properties is proposed in the following paragraphs.…”

Section: Results and Discussionmentioning

confidence: 99%

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

et al. 2017

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The development of high voltage spinel LiMn 1.5 Ni 0.5 O 4 (LMNO) sputtered thin films on functional current collector was reported within the framework of this study. We have first solved the technological issue due to the PtSi phase which originates from the interdiffusion between silicon wafer and chromium/platinum current collector to form PtSi phase under annealing treatment. By substituting the Cr layer with a very dense and pinhole free Al 2 O 3 thin film deposited by ALD acting as a barrier diffusion between the silicon substrate and the LMNO layer, the synthesis process (sputtered thin films annealed under air at 700°C) has been validated. In the second part of this study, the behavior of the sputtered LMNO thin films as a function of the deposition pressure and the film thickness has been investigated. The deposition pressure has been found to play a key role on the Mn−Ni cations ordering in spinel-like structures (P4 3 32 ordered vs Fd3̅ m disordered spinel) and consequently on the electrochemical performance. We have thus shown that LMNO thin films deposited at 10 −2 mbar and annealed at 700°C deliver a normalized capacity of 65 μAh•cm −2 •μm −1 with good capacity retention upon cycling thanks to its disordered spinel structure. Moreover, the Coulombic efficiency has been shown to be highly dependent on the film thickness for high voltage LMNO thin film electrodes. To the best of the authors' knowledge, this work is one of the most complete study combining structural and electrochemical characterizations of the LMNO thin film obtained by sputtering deposition on Si/Al 2 O 3 /Pt functional current collectors.

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Section: Results and Discussionmentioning

confidence: 99%

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

et al. 2017

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“…Wu et al 54) have prepared B x C films via DC magnetron sputtering at various pressures and showed that the stress decreased from ∼2.9 to ∼0.4 GPa with an increase in pressure. Kulikovsky et al 55) have annealed B 4 C films prepared via DC magnetron sputtering in air atmosphere, and the stress was reduced from ∼3.1 to ∼0.5 GPa with increasing annealing temperature. The internal stresses of our samples were lower than those reported by Lousa et al 4) and Ulrich et al; 10) however, their values were high and must be further reduced.…”

Section: Resultsmentioning

confidence: 99%

Photovoltaic and mechanical properties of boron carbide films prepared by magnetron sputtering

Nishida,

Sato,

Enta

et al. 2024

Jpn. J. Appl. Phys.

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In this study, amorphous boron carbide (BxC) and hydrogenated amorphous BxC (BxC:H) films were deposited via magnetron sputtering to investigate the effects of hydrogen on the film properties. The critical load decreased with increasing H2 flow ratio, probably due to an increase in the internal stress. In addition, the optical bandgap increased with the H2 flow ratio increased. The bandgap was controlled by the chemical bonding of carbon atoms and the chemical composition of films. The resistivity of the films increased with the H2 flow ratio and bandgap energy. The current–voltage characteristics of BxC(:H)/n-type Si heterojunctions under white light illumination showed that the short-circuit current density and open-circuit voltage were higher than the previously reported values. Results revealed that the introduction of hydrogen during deposition reduced the short-circuit current density, fill factor, and conversion efficiency, whereas the open-circuit voltage remained almost unchanged.

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“…It is well known that amorphous boron carbide films deposited by magnetron sputtering have high residual compressive stresses dependent on the deposition conditions [29]. The residual stresses can be relaxed by annealing of the films [30]. In this work a Gaussian laser beam was used.…”

Section: Discussionmentioning

confidence: 99%

Large-area homogeneous periodic surface structures generated on the surface of sputtered boron carbide thin films by femtosecond laser processing

Serra

Oliveira

et al. 2015

Applied Surface Science

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Amorphous and crystalline sputtered boron carbide thin films have a very high hardness even surpassing that of bulk crystalline boron carbide ( 41 GPa). However, magnetron sputtered B-C films have high friction coefficients (C.o.F) which limit their industrial application. Nanopatterning of materials surfaces has been proposed as a solution to decrease the C.o.F. The contact area of the nanopatterned surfaces is decreased due to the nanometre size of the asperities which results in a significant reduction of adhesion and friction. In the present work, the surface of amorphous and polycrystalline B-C thin films deposited by magnetron sputtering was nanopatterned using infrared femtosecond laser radiation. Successive parallel laser tracks 10 m apart were overlapped in order to obtain a processed area of about 3 mm 2. Sinusoidal-like undulations with the same spatial period as the laser tracks were formed on the surface of the amorphous boron carbide films after laser processing. The undulations amplitude increases with increasing laser fluence. The formation of undulations with a 10 µm period was also observed on the surface of the crystalline boron carbide film processed with a pulse energy of 72 J. The amplitude of the undulations is about 10 times higher than in the amorphous films processed at the same pulse energy due to the higher roughness of the films and consequent increase in laser radiation absorption. LIPSS formation on the surface of the films was achieved for the three B-C films under study. However, LIPSS are formed under different circumstances. Processing of the amorphous films at low fluence (72 J) results in LIPSS formation only on localized spots on the film surface. LIPPS formation on the top of the undulations formed after laser processing

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Effect of air annealing on mechanical properties and structure of amorphous B4C films

Cited by 15 publications

References 17 publications

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

Photovoltaic and mechanical properties of boron carbide films prepared by magnetron sputtering

Large-area homogeneous periodic surface structures generated on the surface of sputtered boron carbide thin films by femtosecond laser processing

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Effect of air annealing on mechanical properties and structure of amorphous B4C films

Cited by 15 publications

References 17 publications

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn1.5Ni0.5O4 Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn1.5Ni0.5O4 Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

Photovoltaic and mechanical properties of boron carbide films prepared by magnetron sputtering

Large-area homogeneous periodic surface structures generated on the surface of sputtered boron carbide thin films by femtosecond laser processing

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Product

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Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications

Tuning the Cation Ordering with the Deposition Pressure in Sputtered LiMn_1.5Ni_0.5O₄ Thin Film Deposited on Functional Current Collectors for Li-Ion Microbattery Applications