E-beam Nanolithography Integrated with Scanning Electron Microscope

Nabity, J. C.; Compbell, Lesely Anglin; Zhu, Mingshan; Zhou, Weilie

doi:10.1007/978-0-387-39620-0_5

Cited by 4 publications

(1 citation statement)

References 67 publications

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“…Because of this fragile nature, they face an unsolved problem, which is how to integrate them at an individual level into devices without altering their structure and, consequently, their properties during device fabrication. Some nanofabrication techniques are being promoted as suitable for integration of nanostructures, the most successful ones being based on electron or focused ion beams. − These are able to locate by beam scanning a specific, individual nanostructure before patterning contacts on it using various beam-assisted processes. However, their main drawback is that, because they rely on charged particles of energies in the order of keV, they can damage sensitive structures 7 and induce contamination and changes in the substrate over an extended area 8 that can alter the properties of the resulting devices.…”

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Integration of Individual Nanoscale Structures into Devices Using Dynamic Nanostenciling

et al. 2007

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We succeeded in integrating individual, pre-existing nanostructures into functional devices using ultrahigh vacuum dynamic nanostenciling and show working devices based on single-walled carbon nanotubes, a benchmark nanomaterial, and porphyrin J-aggregates, a "soft" supramolecular nanomaterial. Nanostructures are first located via atomic force microscopy, while device elements are added step by step, with an achieved positional accuracy of 20 nm, using a shadow mask assembly that moves while being exposed to evaporated material. Electronic transport, potentiometry, and scanning Kelvin probe were used for control at any fabrication stage and were available in situ. Such complex fabrication/characterization capabilities, applicable repeatedly, reliably, and nondestructively, pave the way for dynamic nanostenciling instrumentation to establish itself as a viable tool for easy integration and prototyping of fragile nanostructures synthesized through a wide range of processes.

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Integration of Individual Nanoscale Structures into Devices Using Dynamic Nanostenciling

et al. 2007

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A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

Liu

Zhang

2022

Journal of Mechanical Design

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Electron beam lithography (EBL) is an important lithographic process of scanning a focused electron beam (e-beam) to direct write a custom pattern with nanometric accuracy. Due to the very limited field of the focused election beam, a motion stage is needed to move the sample to the e-beam field for processing large patterns. In order to eliminate the stitching error induced by the existing “step and scan” process, we in this paper propose a large range compliant nano-manipulator so that the manipulator and the election beam can be moved in a simultaneous manner. We also present an optimization design for the geometric parameters of the compliant manipulator under the vacuum environment. Experimental results demonstrate 1 mm × 1 mm travel range with high linearity, ~ 0.5% cross-axis error and 5 nm resolution. Moreover, the high natural frequency (~ 56 Hz) of the manipulator facilitates it to achieve high-precision motion of EBL.

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Investigation of electron beam nanolithography processes, mechanisms, and applications

Mohammad¹

2013

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E-beam Nanolithography Integrated with Scanning Electron Microscope

Cited by 4 publications

References 67 publications

Integration of Individual Nanoscale Structures into Devices Using Dynamic Nanostenciling

Integration of Individual Nanoscale Structures into Devices Using Dynamic Nanostenciling

A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

Investigation of electron beam nanolithography processes, mechanisms, and applications

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