2010
DOI: 10.1016/j.mee.2010.04.001
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E-beam lithography of computer generated holograms using a fully vectorial 3D beam propagation method

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Cited by 6 publications
(2 citation statements)
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“…This comparison focused on typical fabrications speeds (in terms of treated area per unit of time) that can be achieved as function of the size of the features that can be produced (resolution). Technologies like photolithography, direct laser writing, or micro‐milling reach relatively low processing speeds (between 0.01 and 200 cm 2 min −1 ) for feature sizes between 0.1 and 100 μm . Furthermore, the fabrication speed is inversely proportional to the achievable structure size, i.e., a lower fabrication speed has to be used for smaller structures.…”
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confidence: 99%
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“…This comparison focused on typical fabrications speeds (in terms of treated area per unit of time) that can be achieved as function of the size of the features that can be produced (resolution). Technologies like photolithography, direct laser writing, or micro‐milling reach relatively low processing speeds (between 0.01 and 200 cm 2 min −1 ) for feature sizes between 0.1 and 100 μm . Furthermore, the fabrication speed is inversely proportional to the achievable structure size, i.e., a lower fabrication speed has to be used for smaller structures.…”
mentioning
confidence: 99%
“…Furthermore, the fabrication speed is inversely proportional to the achievable structure size, i.e., a lower fabrication speed has to be used for smaller structures. Furthermore, lithographic technologies cannot be used on complex geometries, e.g., 3D parts, which strongly limit their applicability for real technological parts …”
mentioning
confidence: 99%