Computer generated hologram-ROM fabrication and duplication by EBL and UV-NIL

Fabrication of eight-step diffractive optical element for hologram-ROM

“…There have been some reports about the fabrication of nanoscale 3D patterns using electron beam lithography (EBL) [4] or thermal processes [5]. To fabricate CGH-ROM effectively at a high throughput, we have developed a fabrication process that combines EBL and ultraviolet nanoimprint lithography (UV-NIL) without the lift-off and etching processes [6,7]. In the case of our method, there is no additional dry etching process because we use a spin-on-glass material as the positive-type EB resist and because it is possible to carry our UV-NIL directly.…”