Dynamic scaling of the surface roughness of Cu deposited using a chemical bath

Hasan, N. M.; Mallett, Jonathan J.; Filho, Sebastião Gomes dos Santos; Pasa, André A.; Schwarzacher, Walther

doi:10.1103/physrevb.67.081401

Cited by 31 publications

(38 citation statements)

References 19 publications

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“…It is of no importance for this study whether the layer growth obeys the normal or the anomalous scaling because for both cases the saturation roughness no longer increases with the enlargement of the area under investigation. 38 It was also found for both ED 41 and chemically deposited 42 homogeneous metal films and multilayers 43 that the saturation roughness can be measured at a length scale of 1 m when the total deposit thickness is smaller than about 300 nm. The total thickness of the multilayer deposits in this study is only about one-third of the above value.…”

Section: Discussionmentioning

confidence: 97%

Application of Surface Roughness Data for the Evaluation of Depth Profile Measurements of Nanoscale Multilayers

Bartok

Csík

Vad

et al. 2009

J. Electrochem. Soc.

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A secondary neutral mass spectrometric ͑SNMS͒ depth profile study of electrodeposited Co/Cu multilayers was performed. Depth profile measurements were performed both in the conventional way ͑i.e., starting the sputtering from the final deposit surface͒ and in the reverse manner ͑i.e., detaching the multilayers from the substrate and starting the analysis from the substrate side, which was very smooth as compared to the final deposit surface͒. The latter method could yield significantly larger intensity fluctuations in the SNMS spectra. Surface roughness data were measured with atomic force microscopy ͑AFM͒ for multilayers with different bilayer numbers but otherwise exhibiting the same layer structure as those used for the depth profiling. The experimental AFM surface roughness evolution was used to calculate the result of the depth profile measurements quantitatively. An excellent agreement was obtained between this calculation and the SNMS measurements. It was shown that the decrease in the intensity fluctuations during the depth profile analysis stems mainly from the increase in surface roughness of the samples studied, especially in the conventional sputtering mode. It was also concluded that the thickness fluctuation of the entire multilayer deposit and that of each layer are strongly correlated. DOI: 10.1149/1.3133182 .Nanoscale magnetic/nonmagnetic multilayers are in the forefront of materials research since the discovery of giant magnetoresistance ͑GMR͒ in these nanostructures.1,2 Multilayers are mostly produced by physical methods ͑evaporation, sputtering, and molecular beam epitaxy͒, some of them applying a fairly expensive high vacuum system. The feasibility of the electrodeposition of metallic magnetic/ nonmagnetic multilayers with GMR was demonstrated 3 a few years after the discovery of the phenomenon. Although electrodeposition has long been considered as a possible low cost alternative to the physical sample preparation techniques, the quality of the electrodeposited ͑ED͒ multilayers is still inferior to their physically produced analogs. The literature of the ED multilayer films with GMR amounts to some 140 papers, 4-6 but very little is known about why the sample quality, especially GMR, cannot achieve the properties of the samples prepared by physical methods.Although depth profile analysis is a very efficient tool for the characterization of element distribution and the interface quality of ED multilayer samples, only a few studies were published hitherto. Basile et al.7 studied the depth profile of ED Co/Cu sandwiches by Auger electron spectroscopy. They found that the observed interface width of approximately 20 nm is an inherent feature of the sample itself rather than the artifact of the sputtering method used for the depth profiling ͑although the sputtering also leads to some intermixing at a smaller depth scale 8,9 ͒. According to Tokarz et al., 10 the interface width of ED Cu͑200 nm͒/Ni͑200 nm͒ bilayers can also be estimated as being 20-30 nm, as shown by their secondary-ion mass spe...

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Section: Discussionmentioning

confidence: 97%

Application of Surface Roughness Data for the Evaluation of Depth Profile Measurements of Nanoscale Multilayers

Bartok

Csík

Vad

et al. 2009

J. Electrochem. Soc.

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“…In other systems, the scaling of surface roughness is characterized by different local and global behaviors (i.e., at short and long length scales L) of the surface roughness [11][12][13][14], a result that precludes the use of the FamilyVicsec relation [6]. In order to explain the anomalous scaling observed, some authors have defined different scaling relations for the local and global surface fluctuations [6], while other authors have developed modified scaling relations where the local and global behaviors are gathered in a single expression [13].…”

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confidence: 99%

“…To understand the scaling properties and the microstructure developed by systems depicting an anomalous scaling behavior [11][12][13][14] and, in particular, our own PECVD films, the film growth has been modeled by means of a kinetic Monte Carlo simulation. In this regard it is interesting to note some characteristic features of the PECVD procedure such as the existence of reactive species in the gas phase and dangling bonds at the surface.…”

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confidence: 99%

Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films

et al. 2006

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The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of ranging from 0.86 to 0.2 are obtained. DOI: 10.1103/PhysRevLett.96.236101 PACS numbers: 68.55.ÿa, 64.60.Ht, 68.47.ÿb, 81.15.Gh Rough surfaces and interfaces are ubiquitous in nature, and from the technological point of view the control of their roughness is becoming critical for applications in fields such as microelectronics, image formation, surface coating, or thin film growth [1]. In this context, during the last years there has been an increasing interest in the description of the self-affine kinetic roughening of surfaces [2 -6]. This regime is characterized by an increase of the roughness with time and/or the scale of observation in a self-affine fashion [7,8]. The conventional dynamic scaling theory, the theoretical background used for the description of these phenomena, is based on the so-called FamilyVicsec relation, which models the evolution of the surface roughness -defined as the rms value of the heights of the different points of the interface-with the deposition time and the scale of measurement by means of the following expression [8]:where is the so-called roughness exponent and the growth exponent. According to the dynamic scaling theory, there exist only a finite number of universality classes characterized by certain values of the ( ; ) exponents, so that all the experimental systems would fall into one of these classes. The dynamic scaling theory can then be understood as an extension of the theoretical framework used for the description of the scaling properties of equilibrium phase transitions to nonequilibrium systems [7].In the last years a number of experimental results have appeared that cannot be interpreted in terms of the conventional dynamic scaling theory. In some works, values of the and/or exponents which do not belong to any of the universality classes have been reported. An example of this behavior is the finding of very high values of the growth exponent (i.e., > 0:5) [2,9]. To account for these values, alternative explanations of that of the universality classes have been proposed. One of the most widely used models is the nondeterministic model of Das SarmaTamborenea [10], that relates the variations of the growth exponent with the control of film growth by surface diffusion. For 2D surfaces, this model accounts for values of this exponent ranging from 0.17 to 0.5, this latter value being only obtained if diffusion is neglected. In the same context, Elsholtz et al. [9] presented a model where they considered a diffusion energy with two contributio...

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“…These power-law dependence of the quantity on time is known as the dynamical scaling phenomena [9,4,6,5]. @ The dynamical exponent depends sensitively on the expansion speed and is larger for slower expansion.…”

Section: 0436mentioning

confidence: 99%

An observation of a nascent fractal pattern in MD simulation for a fragmentation of an fcc lattice

Chikazumi

Iwamoto

2005

Chaos, Solitons & Fractals

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To seek for a possible origin of fractal pattern in nature, we perform a molecular dynamics simulation for a fragmentation of an infinite fcc lattice. The fragmentation is induced by the initial condition of the model that the lattice particles have the Hubble-type radial expansion velocities. As time proceeds, the average density decreases and density fluctuation develops. By using the box counting method, it is found that the frequency-size plot of the density follows instantaneously a universal power-law for each Hubble constant up to the size of a cross-over. This cross-over size corresponds to the maximum size of fluctuation and is found to obey a dynamical scaling law as a function of time. This instantaneous generation of a nascent fractal is purely of dynamical origin and it shows us a new formation mechanism of a fractal patterns different from the traditional criticality concept.Key words: fractal, power law, molecular dynamics, fragmentation PACS: 05.45. Df, 05.65.+b, 62.20.Mk Since the pioneering work of Mandelbrot [1] a large effort has been directed towards understanding the ubiquitous manifestation of fractal structure in nature. Since fractal structure is intimately related to a scaling property, a customary way of identifying the fractal is to check if the power-law relation of the frequency as functions of the size holds. Malcai et al. [2] in this way have listed the fractal dimensions and the corresponding scaling ranges for a variety of physical systems. They pointed out that the finiteness of the fractal

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Dynamic scaling of the surface roughness of Cu deposited using a chemical bath

Cited by 31 publications

References 19 publications

Application of Surface Roughness Data for the Evaluation of Depth Profile Measurements of Nanoscale Multilayers

Application of Surface Roughness Data for the Evaluation of Depth Profile Measurements of Nanoscale Multilayers

Influence of the Angular Distribution Function of Incident Particles on the Microstructure and Anomalous Scaling Behavior of Thin Films

An observation of a nascent fractal pattern in MD simulation for a fragmentation of an fcc lattice

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