2020
DOI: 10.29292/jics.v15i2.140
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Dual Port 8T SRAM Cell Using FinFET & CMOS Logic for Leakage Reduction and Enhanced Read & Write Stability

Abstract: Static Random-Access Memory cells with ultralow leakage and superior stability are the primary choice of embedded memories in contemporary smart devices. This paper presents a novel 8T SRAM cell with reduced leakage and improved stability. The proposed SRAM cell uses a stacking effect to reduce leakage and transmission gate as an access transistor to enhance stability. The performance of the proposed 8T SRAM cell with a stacked transistor has been analyzed based on the power consumption and static noise margin… Show more

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Cited by 10 publications
(3 citation statements)
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References 26 publications
(32 reference statements)
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“…Moreover, the memory cell must be power efficient, area-efficient, and robust to any process variation. The stability of the cell can be analyzed with the help of a butterfly curve [26,27]. SRAM Stability can be calculated by SNM which is defined as the maximum noise voltage that the cell node can withstand without altering its value during any operation.…”
Section: Sram Cellmentioning
confidence: 99%
“…Moreover, the memory cell must be power efficient, area-efficient, and robust to any process variation. The stability of the cell can be analyzed with the help of a butterfly curve [26,27]. SRAM Stability can be calculated by SNM which is defined as the maximum noise voltage that the cell node can withstand without altering its value during any operation.…”
Section: Sram Cellmentioning
confidence: 99%
“…Feedback mechanism using Schmitt trigger-based SRAMs are proposed in [15], [16]. Dual port SRAM for imptoved stability has been proposed in [17]. FinFET SRAM with minimum variatins and improved stability has been proposed in [18].…”
Section: Literature Reviewmentioning
confidence: 99%
“…IG operation starts when two gates have dissimilar voltages and the remaining gate is employed to switch devices and control transistor threshold voltage [6][7][8]. Te various height elements of a fn are quantized width (W) and H fn [9,10]. Te quantization width of a SG FinFET and quantization width of IG FinFET can be calculated using the following equation:…”
Section: Introductionmentioning
confidence: 99%