2003
DOI: 10.1016/s0167-9317(03)00093-5
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Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production

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Cited by 5 publications
(2 citation statements)
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“…Therefore, a new patterning technology is necessary to overcome the limitation of the optical lithography. [1,2,3] Among several new patterning technologies, electron-beam lithography can lead to the further reduction in the minimum feature size from 0.5 ㎛ ∼ 1.0 ㎛ by the conventional optical lithography to less than 100nm. However, electron-beam lithography requires longer process times than the optical lithography technology.…”
Section: Introductionmentioning
confidence: 99%
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“…Therefore, a new patterning technology is necessary to overcome the limitation of the optical lithography. [1,2,3] Among several new patterning technologies, electron-beam lithography can lead to the further reduction in the minimum feature size from 0.5 ㎛ ∼ 1.0 ㎛ by the conventional optical lithography to less than 100nm. However, electron-beam lithography requires longer process times than the optical lithography technology.…”
Section: Introductionmentioning
confidence: 99%
“…(1) Reusable quartz master can be reused in the electroplating process for the stamper fabrication, while conventional master with photoresist cannot be reused. (2) In the electroplating process, electroplating solution can permeate the interface between photoresist and quartz substrate of the conventional master with photoresist, while the reusable quartz master are free from the permeability of electroplating solution. Therefore precise stamper can be fabricated using reusable quartz master.…”
Section: Introductionmentioning
confidence: 99%