Dry development of photosensitive polyimides for high resolution and aspect ratio applications

Abstract

Dry development of sub-0.25 μm features patterned with 193 nm silylation resist Application of plasma polymerized methylsilane resist for all-dry 193 nm deep ultraviolet processing A plasma developing process for photosensitive polyimide layers has been investigated as an alternative to wet development. Silylation of photoimageable polyimide by applying an organosilicon compound and subsequent ultraviolet exposure using a g-line mask aligner equipment lead, as a consequence, to copolymerization of photoactive functional groups of silylating agents and sensitizer groups of the polyimide-based photoresists. Development of the photoresist layer is carried out by means of oxygen-containing plasma. Interaction of oxygen plasma with a silylated surface of polyimide leads to the formation of a silicon oxide layer that acts as a barrier giving large differences in the etching rates of the photoresist covered and not covered with organosilane. The influence of O 2 plasma etching process parameters on the etching selectivity is studied. The photochemical silylation process and the dry developing method have been characterized by scanning electron microscopy and Fourier transform infrared spectroscopy.

Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

“…1b). [23] This optimization of the O 2 -RIE process enables us to make lithographic masks with arrays of posts of 30±40 nm in height and 20±30 nm in diameter from a single spin-coated block copolymer film. 1c).…”

Anisotropic etching of polymer films by high energy (∼100s of eV) oxygen atom neutral beams

“…The behavior of ion flux and thus neutral beam flux with pressure is manifested in the behavior of the etch rate. A maximum in polymer etch rate with pressure in oxygen plasmas has been observed by Munoz and Dominguez, 26 Juan and Pang, 24 Hartney et al 27 and Hsiao, Miller, and Kellock. 28 It should be noted, however that, in contrast to our case, in all these studies the sample was immersed in the plasma.…”