2020
DOI: 10.1088/1361-6528/ab7aa6
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Droplet epitaxy quantum dot based infrared photodetectors

Abstract: The fabrication and characterization of an infrared photodetector based on GaAs droplet epitaxy quantum dots embedded in Al 0.3 Ga 0.7 As barrier is reported. The high control over dot electronic properties and the high achievable number density allowed by droplet epitaxy technique permitted us to realize a device using a single dot layer in the active region. Moreover, thanks to the independent control over dot height and width, we were able to obtain a very sharp absorption peak in the thermal infrared regio… Show more

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Cited by 13 publications
(15 citation statements)
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“…Nonetheless, very recent studies on InAs/InP QDs have evidenced the role of CI even for isotropic QDs [32]. For the particular system, InAs/InP elongated along the [1][2][3][4][5][6][7][8][9][10] axis with strain and a small volume (h QD = 3 nm and √ r 0x r 0y = 20 nm), CI has a vanishing effect on δ DD for β < 4 (t = 0 − 0.9 in Ref. [32]), while for β = 4, δ BB and δ BD can be increased by up to 80% and 40%, respectively.…”
Section: Resultsmentioning
confidence: 94%
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“…Nonetheless, very recent studies on InAs/InP QDs have evidenced the role of CI even for isotropic QDs [32]. For the particular system, InAs/InP elongated along the [1][2][3][4][5][6][7][8][9][10] axis with strain and a small volume (h QD = 3 nm and √ r 0x r 0y = 20 nm), CI has a vanishing effect on δ DD for β < 4 (t = 0 − 0.9 in Ref. [32]), while for β = 4, δ BB and δ BD can be increased by up to 80% and 40%, respectively.…”
Section: Resultsmentioning
confidence: 94%
“…(iii) effects due to the zinc-blende symmetry and nonequivalent [110] and [1][2][3][4][5][6][7][8][9][10] axes [42];…”
Section: Resultsmentioning
confidence: 99%
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“…Droplet epitaxy [1][2][3][4] and droplet etching [5][6][7][8][9][10][11][12][13] (DE) are alternative growth protocols to Stranski-Krastanov for the fabrication of strain-free III-V-based semiconductor quantum dots (QDs). This emerging class of nanostructures has been efficiently exploited for the fabrication of classical optoelectronic devices such as photodetectors [14], lasers [15][16][17][18][19], and quantum emitters [13,[20][21][22][23][24][25][26][27][28][29][30][31][32], demonstrating the relevance of this approach for realistic applications.…”
Section: Introductionmentioning
confidence: 99%
“…Droplet epitaxy (DE) is a well-established method for producing quantum dots (QDs) with an independent control of nanostructure size and its density in the wide range [ 1 , 2 ]. Using DE, it is possible to fabricate low-density QDs for quantum emitters [ 1 , 2 , 3 , 4 ] or high-density nanostructures for laser and photodetector devices [ 5 , 6 , 7 ].…”
Section: Introductionmentioning
confidence: 99%