2021
DOI: 10.1109/led.2020.3047522
|View full text |Cite
|
Sign up to set email alerts
|

Drain Current Density Over 1.1 A/mm in 2D Hole Gas Diamond MOSFETs With Regrown p++-Diamond Ohmic Contacts

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
12
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 28 publications
(12 citation statements)
references
References 22 publications
0
12
0
Order By: Relevance
“…The maximum drain current (I Dmax ) is −21.9 mA/mm at V GS = −5 V and V DS = −10 V. Compared with the reported device in Table 1 , this work has a relatively high current density and mobility. However, the current density is small, especially compared with a normally-on device (1.1 A/mm [ 29 ]). This is because, in normally-off devices, the current density is lower because the carriers in the channel are depleted by insulators or metal.…”
Section: Resultsmentioning
confidence: 99%
“…The maximum drain current (I Dmax ) is −21.9 mA/mm at V GS = −5 V and V DS = −10 V. Compared with the reported device in Table 1 , this work has a relatively high current density and mobility. However, the current density is small, especially compared with a normally-on device (1.1 A/mm [ 29 ]). This is because, in normally-off devices, the current density is lower because the carriers in the channel are depleted by insulators or metal.…”
Section: Resultsmentioning
confidence: 99%
“…The systematic interface dependence at the Al 2 O 3 /C-H diamond interface has not been discussed to date. However, MOSFETs on (111) and (110) substrates present higher drain current densities [21,81] than those on (001) substrates, showing similar trends to the effects of adsorbates or electrolyte solutions [75]. The formation of the negatively charged sites in the insulator can be influenced by the C-H surface dipoles, where the surface side is partially positively charged by the H atoms.…”
Section: Dhg On C-h Diamondmentioning
confidence: 88%
“…During the past 30 years, the growth of diamond has gained a steady development due to the great advances in the chemical vapor deposition (CVD) methodology and the expanding application requirements in electronics, [ 30 ] photonics, [ 31 ] communications, [ 32 ] sensors, [ 33 ] and thermal management. [ 34 ] In viewing of the progress of diamond growth and micromachining technologies, different diamond forms such asMCD, NCD, UNCD, and SCD were developed to fabricate diamond MEMS devices.…”
Section: Microfabrication Of Diamond Memsmentioning
confidence: 99%