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2005 European Conference on Power Electronics and Applications 2005
DOI: 10.1109/epe.2005.219523
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Double-sided low-temperature joining technique for power cycling capability at high temperature

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Cited by 42 publications
(9 citation statements)
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“…The finished joint typically has a porosity of 80-85%, a thermal conductivity of about 250 W/mK, and electrical conductivity of 40 MS/m. The thermal and electrical conductivity are consistent with pure silver of similar porosity [98], and are significantly better than those of eutectic SnPb die attach. The adhesion strength of the sintered silver joint was also found to be higher than that of the eutectically soldered joint [97].…”
Section: Chip and Substrate Attachmentsupporting
confidence: 56%
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“…The finished joint typically has a porosity of 80-85%, a thermal conductivity of about 250 W/mK, and electrical conductivity of 40 MS/m. The thermal and electrical conductivity are consistent with pure silver of similar porosity [98], and are significantly better than those of eutectic SnPb die attach. The adhesion strength of the sintered silver joint was also found to be higher than that of the eutectically soldered joint [97].…”
Section: Chip and Substrate Attachmentsupporting
confidence: 56%
“…Furthermore, the uniform microporous silver microstructure provided additional compliance which acted to relieve the thermo-mechanical stresses due to CTE mismatch, thus improving the joint reliability under thermal or power cycling. Joints made in this way have shown a twenty times improvement in power cycling reliability at ∆T j = 130°C over that of eutectic solder joints in standard modules, as determined from an extrapolation of the reliablilty model [98].…”
Section: Chip and Substrate Attachmentmentioning
confidence: 96%
“…In [11,12], dynamic thermal parameters of semiconductors are calculated through datasheet and/or experiments, providing temperature rise of the connection point. Also, long-term experiments are reported in [13][14][15] in which the switching packages are subjected to thermal stress. The junction temperature rise is then used to obtain the average temperature as well as the difference between maximum and minimum junction temperature.…”
Section: Introductionmentioning
confidence: 99%
“…It causes crack or delamination failures in the wire bonding area or chip attaching material [1][2]. And there have been researched to reduce the temperature swing [3] The problem is that quantitative acceleration test is not easy as direct junction temperature measurement is not possible. Intermittent operating condition originated failure can be easily reproduced by excessive test condition.…”
Section: Introductionmentioning
confidence: 99%