2012
DOI: 10.1364/ol.37.003603
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Double-layered nanoparticle stacks for spectro-electrochemical applications

Abstract: Here we present a surface based on double-layered nanoparticle stacks suitable for spectro-electrochemical applications. The structure is formed on a continuous gold layer by a two-dimensional periodic array of stacks of gold and tantalum pentoxide nanodisks. Reflection spectra in the visible wavelength region showed the multiple-resonant nature of surface plasmon (SP) excitations in the nanostructure, which is in good agreement with simulations based on a finite-difference-time-domain method. The multiple SP … Show more

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Cited by 7 publications
(8 citation statements)
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“…Frank et al 279 presented a nanostructure based on double-layered NP stacks suitable for spectra-electrochemical applications. Their structure was based on a continuous gold layer upon which periodic arrays of tantalum pentoxide (Ta 2 O 5 ) nanodisks were formed.…”
Section: Miscellaneous: Applications Of Slrs In Biosensing/biorecognimentioning
confidence: 99%
“…Frank et al 279 presented a nanostructure based on double-layered NP stacks suitable for spectra-electrochemical applications. Their structure was based on a continuous gold layer upon which periodic arrays of tantalum pentoxide (Ta 2 O 5 ) nanodisks were formed.…”
Section: Miscellaneous: Applications Of Slrs In Biosensing/biorecognimentioning
confidence: 99%
“…Most recent sensing techniques utilize surface enhancement of plasmon excitations induced on metal nanostructures like Raman scattering, refractive index sensing, fluorescence-and infrared spectroscopy [5][6][7][8][9][10][11]. One of the most widely studied types of nanostructures is twodimensional gratings of metal nanoparticles arranged on top of a dielectric spacer layer and a supporting metal film [12][13][14][15]. This kind of nanostructure provides a very high grade of reproducibility and pronounced plasmon excitations that lead to ultra-high enhancement factors [5,16].…”
Section: Introductionmentioning
confidence: 99%
“…The top-down lithographic process used to create the disk-stack nanostructure has been reported previously. 31 The regular arranged disk-stack pattern was defined by electron beam (e-beam) exposure of a negative ebeam resist. After removal of the unexposed parts of the resist, the stack-array structure was created by ion-beam etching.…”
mentioning
confidence: 99%