2011
DOI: 10.2528/pier10110309
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Double and Triple Langmuir Probes Measurements in Inductively Coupled Nitrogen Plasma

Abstract: Abstract-The double and triple Langmuir probe diagnostic systems with their necessary driving circuits are developed successfully for the characterization of laboratory built low pressure inductively coupled nitrogen plasma, generated by 13.56 MHz radio frequency (RF) power supply along with an automatic impedance matching network. Using the DC properties of these two probes, the discharge plasma parameters like ion saturation current (I io ), electron temperature (kT e ) and electron number density (n e ) are… Show more

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Cited by 42 publications
(49 citation statements)
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References 18 publications
(31 reference statements)
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“…This increasing trend in kT e under the influence of rising ac input voltage might be due to the increase in kinetic energy of the discharge plasma electrons. But the most important reason of this increment is the availability of more and more highly energetic electrons in high energy tail of the electron energy distribution function (EEDF) at relatively higher input voltages [19]. As the relation for mean energy of electrons is:…”
Section: Discussionmentioning
confidence: 99%
“…This increasing trend in kT e under the influence of rising ac input voltage might be due to the increase in kinetic energy of the discharge plasma electrons. But the most important reason of this increment is the availability of more and more highly energetic electrons in high energy tail of the electron energy distribution function (EEDF) at relatively higher input voltages [19]. As the relation for mean energy of electrons is:…”
Section: Discussionmentioning
confidence: 99%
“…Plasma technology is a kind of technology with novel concept and newly working principle, and its latent application in electromagnetic (EM) field is splendid, such as plasma stealth technology [1][2][3], plasma antennas [4][5][6], plasma diagnostic [7,8], plasma photonic crystals [9] and communications through plasma sheath [10][11][12][13][14]. It is very important to find out the mechanism and phenomena about the interactions between EM wave and plasma in the study of this technology.…”
Section: Introductionmentioning
confidence: 99%
“…In the limit eV d3 >> 2kT e , Eq.5 simplifies to kT e = eV d2 /ln 2. 9 In addition, if assumptions 2, 4, and 5 are valid…”
Section: B Langmuir Probesmentioning
confidence: 99%