Doped Silicon Oxide Deposition by Atmospheric Pressure and Low Temperature Chemical Vapor Deposition Using Tetraethoxysilane and Ozone

Abstract

a b s t r a c tLittle is known about the prevalence of hepatitis C virus (HCV) among healthcare workers (HCW) in Egypt, where the highest worldwide prevalence of HCV exists. The prevalence of HCV, hepatitis B virus and Schistosoma mansoni antibodies was examined in 842 HCWs at the National Liver Institute in the Nile Delta, where >85% of patients are HCV antibodypositive. The mean age of HCWs was 31.5 years and they reported an average of 0.6 ± 1.2 needlesticks/HCW/year. The prevalence of anti-HCV, hepatitis B surface antigen (HBsAg) and co-infection was 16.6%, 1.5% and 0.2%, respectively. HCV-RNA was present in 72.1% of anti-HCV-positive HCWs, and all but one subject were infected with HCV genotype 4. Schistosoma mansoni antibodies were present in 35.1%. The anti-HCV rate increased sharply with age and employment duration, but not among those with needlestick history. After adjusting for other risk factors, the anti-HCV rate was higher among older HCWs [P < 0.001; risk ratio (RR) = 1.086, 95% CI 1.063-1.11], males (P = 0.002; RR = 1.911, 95% CI 1.266-2.885) and those with rural residence (P < 0.001; RR = 2.876, 95% CI 1.830-4.52). Occupation (P = 0.133), duration of employment (P = 0.272) or schistosomal antibody positivity (P = 0.152) were not significant risk factors for anti-HCV positivity. In conclusion, although one in six HCWs had been infected with HCV, the infections were more likely to be community-acquired and not occupationally related.

Moisture Resistance of Annealed Borophosphosilicate Glass Films for Very Large Scale Integrated Circuit Applications

“…Boron appears to accelerate water penetration of the Fig. 15. Water desorption from PSG with 8.5 w/o P and BPSG with high and low phosphorus concentrations after 100 h in the P film and phosphorus suppresses it.…”

Growth Kinetics and Deposition‐Related Properties of Subatmospheric Pressure Chemical Vapor Deposited Borophosphosilicate Glass Film

“…It was shown that TEOS is able to react with oxygen at atmospheric pressure conditions providing a low silicon dioxide deposition rate at temperatures as low as 450ЊC. 43 According to numerous reports, [9][10][11]34 higher silicon dioxide film deposition rates can be achieved by the introduction of ozone into the gas mixture with concentrations above 1 wt %. In contrast, there is no information about the enhancement of dopant precursors oxidation rate with ozone.…”

Review—Mechanical Stress in Chemically Vapor Phase Deposited Boron- and Phosphorus-Contained Silicate Glass Thin Films: A Review

“…Thus, PSG films with higher than about 4 wt% phosphorus become less tensile stressed do not depending on the film growth techniques. Note that data for TEOS-ozone PSG shown in Table IV 48,49 are in agreement, but not displayed in Figs. 5a, 5b.…”

“…The only exception with compressive stress is the data point obtained at very low SACVD process pressure 22.5 Torr and deposition temperature 375 °C. 38 Scarce data for binary glasses 48,49 obtained using I). The absence of experimental data in the range of 0-3 wt% of phosphorus allows making some assumption regarding the possible stress behavior in this concentration range.…”