2019
DOI: 10.1007/s10853-019-03563-z
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Domain growth dynamics in PMN-PT ferroelectric thin films

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Cited by 3 publications
(2 citation statements)
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“…[12,35,36] The average activation field E a and creep exponent 𝜇 extracted from fitting are 2.31 ± 0.36 and 0.54 ± 0.03 MV cm -1 , respectively, which are in good agreement with the reported values for epitaxial films. [29,37] Furthermore, it should be noted that the obtained E a and 𝜇 values are susceptible to intrinsic (e.g., local defect density) and extrinsic (e.g., tip abrasion effects and inhomogeneities in the applied field) factors, [26,32,38] thereby averaging over at least a few tens of independent realizations is imperative to achieve statistically more reliable results. Figure 1e prototypically illustrates the statistically analyzed 𝜇 averaged over a total of 16 independent realizations (four sets of comparable data in Figure 1a) along with its histogramic mapping at the background for a 90 nm thick sample.…”
Section: Domain Wall Creep Dynamicsmentioning
confidence: 99%
“…[12,35,36] The average activation field E a and creep exponent 𝜇 extracted from fitting are 2.31 ± 0.36 and 0.54 ± 0.03 MV cm -1 , respectively, which are in good agreement with the reported values for epitaxial films. [29,37] Furthermore, it should be noted that the obtained E a and 𝜇 values are susceptible to intrinsic (e.g., local defect density) and extrinsic (e.g., tip abrasion effects and inhomogeneities in the applied field) factors, [26,32,38] thereby averaging over at least a few tens of independent realizations is imperative to achieve statistically more reliable results. Figure 1e prototypically illustrates the statistically analyzed 𝜇 averaged over a total of 16 independent realizations (four sets of comparable data in Figure 1a) along with its histogramic mapping at the background for a 90 nm thick sample.…”
Section: Domain Wall Creep Dynamicsmentioning
confidence: 99%
“…For rare earth element doped ferroelectric thin films, a double enhanced dielectric permittivity was obtained in PMN-PT thin films through Pr 3+ ion doping [23]. PMN-PT based thin films also possess many advantages of structure [24], electric and optic properties, such as high transmission [25], high optical damage threshold [20], low material toughness [26], and excellent chemical stability [27], making it as a potential candidate for photoluminescent matrix with RE ions and for optic device integration with powerful conditions. During the photoluminescence process, low energy photons were absorbed while high energy photons were produced.…”
Section: Introduction mentioning
confidence: 99%