1996
DOI: 10.1016/0038-1098(96)00040-3
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Dissociation kinetics of molecular hydrogen in a microwave plasma and its influence on the hydrogen content in diamond films

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Cited by 39 publications
(19 citation statements)
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“…In an earlier study,17 characteristics of the plasma formed in our microwave plasma chemical vapor deposition (MPCVD) system had been investigated. At a pressure of 70 Torr (1 Torr = 133.322 Pa) and a temperature of 925 °C the mixture of hydrogen and methane gases (with 99.2% H 2 ) yielded the following temperature and density of electrons: T eV ≈ 10 eV and n ≈ 10 18 m −3 .…”
Section: Introductionmentioning
confidence: 99%
“…In an earlier study,17 characteristics of the plasma formed in our microwave plasma chemical vapor deposition (MPCVD) system had been investigated. At a pressure of 70 Torr (1 Torr = 133.322 Pa) and a temperature of 925 °C the mixture of hydrogen and methane gases (with 99.2% H 2 ) yielded the following temperature and density of electrons: T eV ≈ 10 eV and n ≈ 10 18 m −3 .…”
Section: Introductionmentioning
confidence: 99%
“…The lifetime of hydrogen active groups is much longer than CH3 active group, and the CH3 active group is sensitive to the chamber pressure [33] . Second, the concentration of hydrogen atoms was reduced with reduced pressure [34] . Therefore, the ratio of CH3 groups to H groups on substrate increases with the decreased chamber pressure.…”
Section: Resultsmentioning
confidence: 99%
“…It has been shown previously that the dissociation rate of molecular hydrogen increases with the increase in the MPD. 6 This is inspite of the increased recombination at higher pressure because of the considerable reduction in the size of the plasma ball. In agreement with Loh and Capelli, 29 we also observe that as the size of the plume decreases the temperature of the plasma ͑plasma ball͒ as well as the atomic H content increases.…”
Section: Discussionmentioning
confidence: 99%
“…Microwave plasma chemical vapor deposition ͑MPCVD͒ is one of the techniques that has been used extensively to grow the films. 1,5 The high density and energy of the electrons in a microwave plasma dissociate H 2 molecules to provide the high concentration of atomic hydrogen ͑H͒, 6 which not only preferentially etches sp 2 carbon but also enhances the density of sp 3 carbon species. 7 However, owing to the nature of the plasma processes, various growth parameters such as T s , growth pressure, and microwave power become dependent upon each other making it difficult to identify the parameters affecting the growth significantly.…”
Section: Introductionmentioning
confidence: 99%