2012
DOI: 10.1016/j.jcrysgro.2012.08.030
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Dislocation-induced variation of generation kinetics of boron–oxygen complexes in silicon

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Cited by 2 publications
(1 citation statement)
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“… Using n-type P-doped CZ silicon not produced from UMG [73,79,82,83,88,89]  Using quasi-monocrystalline silicon technology which has reduced O content. Also, dislocation rich Si, as in the case of quasi-monocrystalline silicon, results in an higher activation energy of B-O complexes [90].…”
Section: Light Induced Degradationmentioning
confidence: 99%
“… Using n-type P-doped CZ silicon not produced from UMG [73,79,82,83,88,89]  Using quasi-monocrystalline silicon technology which has reduced O content. Also, dislocation rich Si, as in the case of quasi-monocrystalline silicon, results in an higher activation energy of B-O complexes [90].…”
Section: Light Induced Degradationmentioning
confidence: 99%