2021
DOI: 10.1063/5.0031476
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Dislocation generation mechanisms in heavily boron-doped diamond epilayers

Abstract: Paper published as part of the special topic on Ultrawide Bandgap Semiconductors ARTICLES YOU MAY BE INTERESTED INSelectively boron doped homoepitaxial diamond growth for power device applications Applied Physics Letters 118, 023504 (2021);

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Cited by 9 publications
(2 citation statements)
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References 21 publications
(29 reference statements)
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“…However, in the case of diamond, proximity effects concerning boron atoms in a closed diamond lattice have been shown to also be effective for that. Therefore, not only a critical thickness is taken into account, but a critical boron content can also be defined [38,39,113], which is of maximum interest to diamond growers. Introduction of other dopants, such as P, also induces defect formation, as can be seen in Figure 6 where a diffraction contrast TEM micrograph is shown.…”
Section: Structural Characterization Techniquesmentioning
confidence: 99%
“…However, in the case of diamond, proximity effects concerning boron atoms in a closed diamond lattice have been shown to also be effective for that. Therefore, not only a critical thickness is taken into account, but a critical boron content can also be defined [38,39,113], which is of maximum interest to diamond growers. Introduction of other dopants, such as P, also induces defect formation, as can be seen in Figure 6 where a diffraction contrast TEM micrograph is shown.…”
Section: Structural Characterization Techniquesmentioning
confidence: 99%
“…Defects and doping are still likewise important topics. In this context, Araujo et al 42 report a comprehensive study on the dislocation generation mechanisms in heavily boron-doped diamond epilayers, establishing conditions to grow dislocation-free boron-doped diamond epilayers on undoped substrates. Lloret et al 43 propose a strategy to perform selectively boron-doped homoepitaxial diamond growth for electronic devices.…”
mentioning
confidence: 99%