2011
DOI: 10.1063/1.3567545
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Dislocation density-dependent quality factors in InGaN quantum dot containing microdisks

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Cited by 10 publications
(15 citation statements)
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“…Thomas Swan close-coupled showerhead reactor on sapphire (0001) substrates with a miscut of (0.25 70.10)1 towards (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) (TMG), trimethylindium (TMI), and ammonia were used as precursors. The pseudo-substrates consist of approximately 4.5 mm of GaN grown at 1020 1C, following deposition of a 30 nm GaN buffer layer at 540 1C [13].…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Thomas Swan close-coupled showerhead reactor on sapphire (0001) substrates with a miscut of (0.25 70.10)1 towards (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) (TMG), trimethylindium (TMI), and ammonia were used as precursors. The pseudo-substrates consist of approximately 4.5 mm of GaN grown at 1020 1C, following deposition of a 30 nm GaN buffer layer at 540 1C [13].…”
Section: Methodsmentioning
confidence: 99%
“…These droplets then re-react with ammonia during the growth of the GaN cap, to form InGaN QDs. QDs formed in this way have been shown to act as single photon emitters [10] and have been successfully incorporated into micro-cavity structures exploiting the AlN/GaN distributed Bragg reflectors [11] and microdisks [12], which allows more efficient light extraction from the QD layer.…”
Section: Introductionmentioning
confidence: 99%
“…To pattern the template is a rather complex technique and is hard to be used in the manufacture industrial production. Oliver et al reported the realization of micro-disk InGaN laser on sapphire substrates via growth interruption method [21]. Other research groups also employ the similar growth interruption methods to improve the optical properties of light emitting devices [22][23][24][25].…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, GaN‐based structures considerably suffer from a limited applicability or even failure of methods like (selective) wet or reactive ion etching to prepare small structures with large aspect ratios. In the last years, a photoelectrochemical etching process has been developed which can be applied to slab‐like structures like microdisk resonators 10 showing blue lasing at RT 28 and high‐ Q values with implemented InGaN QDs 29, or photonic crystal defect cavities with InGaN QWs 30 and GaN QDs 31. But there is still a lack of technological methods to realize pillar MCs.…”
Section: Introductionmentioning
confidence: 99%