2021
DOI: 10.1016/j.ultramic.2021.113255
|View full text |Cite
|
Sign up to set email alerts
|

Directly correlated microscopy of trench defects in InGaN quantum wells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
5

Citation Types

1
6
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 11 publications
(17 citation statements)
references
References 45 publications
1
6
0
Order By: Relevance
“…The BSFs of these deep trench structures originate from the underlying green MQWs, which are introduced intentionally by low-temperature growth. Massabuau et al [27,28] also reported that luminescence enhancement of MQWs inside trenches occurs only when the BSFs are formed in the early stages of QW stack growth. Thus, the dot-like emissions of red QWs originate from the regions inside those deep trench structures.…”
Section: Resultsmentioning
confidence: 99%
See 3 more Smart Citations
“…The BSFs of these deep trench structures originate from the underlying green MQWs, which are introduced intentionally by low-temperature growth. Massabuau et al [27,28] also reported that luminescence enhancement of MQWs inside trenches occurs only when the BSFs are formed in the early stages of QW stack growth. Thus, the dot-like emissions of red QWs originate from the regions inside those deep trench structures.…”
Section: Resultsmentioning
confidence: 99%
“…Besides, the peak wavelength of red QWs inside the trench is about 583 nm, which is redshifted by 22 nm compared to those outside trenches. This is mainly due to the enhanced In incorporation induced by the stress relaxation of deep trenches [26,28]. To precisely compare the luminescence degradation of red QWs inside and outside trenches after annealing, the spectra of 35 points in bright spots and 350 points in dark regions were selected from about 6 maps.…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…On the one hand, In will desorb with the increase in temperature [15]; on the other hand, the increase in the pressure of 400 Torr in group D compared to the pressure of 200 Torr in group B will weaken the boundary layer of TMIn passing through the growing film transmission capacity. At lower pressures, the atomic incorporation barrier will be lowered [16], and the sample will shift from 3D to 2D step flow growth [17,18]. Therefore, the group B samples are grown at a lower growth pressure (200 Torr), which will lead to a higher In incorporation efficiency of this group of samples than that of the D group, while also having better growth quality.…”
Section: Resultsmentioning
confidence: 99%