Directed Self‐Assembly of Poly(2‐vinylpyridine)‐<i>b</i>‐polystyrene‐<i>b</i>‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jae-Won; Huang, Caili; Jeong, Gajin; Coughlin, E. Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y.; Kuo, David; Xiao, Shuaigang; Russell, Thomas P.

doi:10.1002/adma.201501585

Cited by 52 publications

(50 citation statements)

References 48 publications

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“…The lamellar microdomains of P2VP‐ b ‐PS‐ b ‐P2VP in thin films with thickness of 43 nm ( L = 2.05 D 0 ) will orient normal to the surface after annealing with acetone vapor. The perpendicular orientation of the lamellar microdomains in the BCP thin film is dominated by the balanced interfacial interactions at the polymer/substrate and polymer/air interfaces . However, with increasing film thickness, out‐of‐plane defects would be observed.…”

Section: Resultsmentioning

confidence: 99%

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Sun

Russell

2017

J Polym Sci B Polym Phys

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Solvent vapor annealing (SVA) is one route to prepare block copolymer (BCP) thin films with long‐range lateral ordering. The lattice defects in the spin‐coated BCP thin film can be effectively and rapidly reduced using SVA. The solvent evaporation after annealing was shown to have a significant impact on the in‐plane ordering of BCP microdomains. However, the effect of solvent evaporation on the out‐of‐plane defects in BCPs has not been considered. Using grazing‐incidence x‐ray scattering, the morphology evolution of lamellae‐forming poly(2‐vinlypyridine)‐b‐polystyrene‐b‐poly(2vinylpyridine) triblock copolymers, having lamellar microdomains oriented normal to substrate surface during SVA, was studied in this work. A micelle to lamellae transformation was observed during solvent uptake. The influence of solvent swelling ratio and solvent removal rate on both the in‐plane and out‐of‐plane defect density was studied. It shows that there is a trade‐off between the in‐plane and out‐of‐plane defect densities during solvent evaporation. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017, 55, 980–989

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Section: Resultsmentioning

confidence: 99%

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Sun

Russell

2017

J Polym Sci B Polym Phys

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“…Metal chelation of BCP species is wellknown to increase the effective interaction parameter (χ eff ), [ 213 ] and most reports so far suggest that a linear relationship exists between increasing χ eff and higher salt concentration loading. [ 214 ] For example, "doping" of lamellar PS-b -PEO [ 215 ] and P2VP-b -PS-b -P2VP [ 216 ] BCPs has been exploited recently through complexing lithium (in PEO microdomains) and copper (in P2VP microdomains) ions for accessing 16 nm and 14 nm periods respectively (see Figure 20 a-c). However, careful tuning is essential with such methods to avoid micellization.…”

Section: Extending Incorporation Methods To Ultra-low Bcp Nanodimensionsmentioning

confidence: 99%

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

et al. 2016

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Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.

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“…In addition, the original pattern remains in the DSA film, which makes the realization of a multilayer device architecture difficult. A combination of these two DSA principles is promising to overcome all of the above‐mentioned shortcomings …”

Section: Maskless Nanofabrication Techniquesmentioning

confidence: 99%

Toward Scalable Flexible Nanomanufacturing for Photonic Structures and Devices

et al. 2016

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Continuous and scalable nanopatterning over flexible substrates is highly desirable for both commercial and scientific interests, but is difficult to realize with traditional photolithographic processes. The recent advancements in nanofabrication methodologies enable light management with photonic structures on flexible materials, providing an increasingly popular strategy to control the light harvesting in the optoelectronic devices of photovoltaics, and in organic and inorganic light-emitting diodes. Here, the current status of nanopatterning technologies for the fabrication of optoelectronic devices is summarized. Scalable nanopatterning technologies for nanomanufacturing on flexible materials are emphasized. Critical challenges in various patterning techniques when considering the resolution, scalability, processing throughput, and the use of masks and resists are addressed. The integration of flexible nanopatterned substrates with light manipulation in organic optoelectronic devices is also discussed; this enables the control of light flux and spectra. Finally, potential development directions are highlighted.

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Directed Self‐Assembly of Poly(2‐vinylpyridine)‐b‐polystyrene‐b‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Cited by 52 publications

References 48 publications

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Toward Scalable Flexible Nanomanufacturing for Photonic Structures and Devices

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