Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Liu, Chi‐Chun; Franke, Elliott; Mignot, Yann; Xie, Ruilong; Yeung, Chun Wing; Zhang, Jingyun; Chi, Cheng; Zhang, Chen; Farrell, Richard A.; Lai, Kafai; Tsai, Hsinyu; Felix, Nelson; Corliss, Daniel

doi:10.1038/s41928-018-0147-4

Cited by 98 publications

(103 citation statements)

References 32 publications

Supporting

Mentioning

103

Contrasting

Order By: Relevance

“…Directed self-assembly of block copolymers (BCPs) provides a scalable route for rationally fabricating large-area patterns with dense nanoscale features at precise locations on a surface 1 – 4 . Directed assembly of BCP domains oriented vertically to the substrate is particularly important because vertical domains can be utilized to produce nanostructures for logic gates 5 , 6 , data storage 6 , 7 , electrical contacts 8 , optical devices 9 , sensors 10 , and separation membranes 11 , 12 , and to provide a template for materials synthesis 13 – 15 .…”

Section: Introductionmentioning

confidence: 99%

Boundary-directed epitaxy of block copolymers

Jacobberger

Thapar

et al. 2020

Nat Commun

View full text Add to dashboard Cite

Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce technologicallyuseful patterns is a challenge. Here, we present a promising approach to direct assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition. Pairs of boundaries are formed at the edges of isolated stripes on a background substrate. Vertical lamellae nucleate at and are pinned by chemical contrast at each stripe/ substrate boundary, align parallel to boundaries, selectively propagate from boundaries into stripe interiors (whereas horizontal lamellae form on the background), and register to wide stripes to multiply the feature density. Ordered BCP line arrays with half-pitch of 6.4 nm are demonstrated on stripes >80 nm wide. Boundary-directed epitaxy provides an attractive path towards assembling, creating, and lithographically defining materials on sub-10 nm scales.

show abstract

Section: Introductionmentioning

confidence: 99%

Boundary-directed epitaxy of block copolymers

Jacobberger

Thapar

et al. 2020

Nat Commun

View full text Add to dashboard Cite

show abstract

“…Thus far, a sub‐30 nm structural pattern has been produced with photoisomerization‐driven directional mass migration of azomaterials . This resolution is comparable to that of current semiconducting technologies, such as extreme UV lithography and directed self‐assembly . Additionally, photochromic NSOM imaging can guarantee a resolution of a few nanometers, exceeding that of scattering‐based conventional NSOM .…”

Section: Discussionmentioning

confidence: 98%

Light‐Directed Soft Mass Migration for Micro/Nanophotonics

Kim

Park

et al. 2019

Advanced Optical Materials

View full text Add to dashboard Cite

In this review, it is argued that soft mass migrations, driven and guided by spatially controlled photopolymerization and photochromic isomerization (also called directional plastic deformation or photofluidization of azobenzene materials), offer toolsets for optical engineers to develop various micro/nanophotonic materials and devices that are not readily available with conventional lithographic methods and self‐assembly techniques. In this direction, the two seemingly different concepts of (i) photopolymerization and (ii) photochromic‐isomerization‐driven mass migrations are tied together, and then recent technological advances in these two fields are summarized, including diffractive optical elements (DOEs), electro‐optic DOE devices, colorimetric sensors, biologically inspired optics, plasmonic devices and near‐field studies, and exceptional point optics. This review establishes the technological viability of light‐directed soft mass migration for the overall evolving field of micro/nanophotonics and its research perspectives.

show abstract

“…In line-space applications lamellar BCPs have been used as mask for the definition of arrays of silicon fins that constitute the central body of non-planar fin field-effect transistors (FinFETs). Multiple works have demonstrated the capability of DSA to fabricate silicon fins [ 108 , 109 , 110 , 111 , 112 , 113 ], with probably the two most well-known being the LiNe and IBM lift-off chemoepitaxial processes. In the LiNe process a cross-linked polymer mat is deposited on the substrate and then patterned by photolithography to define the GPs.…”

Section: Block Copolymers For the Fabrication Of Functional Devicementioning

confidence: 99%

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

et al. 2020

View full text Add to dashboard Cite

Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.

show abstract

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Cited by 98 publications

References 32 publications

Boundary-directed epitaxy of block copolymers

Boundary-directed epitaxy of block copolymers

Light‐Directed Soft Mass Migration for Micro/Nanophotonics

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

Contact Info

Product

Resources

About