Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter

Kessels, Mélanie V.; Nassour, C.; Grosso, Philippe; Heggarty, Kevin

doi:10.1016/j.optcom.2010.03.056

Cited by 22 publications

(14 citation statements)

References 30 publications

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“…The fabrication facilities we used to make DBA are our home-built direct-write photo-plotter [21][22]. In this experiment work, the photoresist is S1813 from Mirco Resist Technology, and the refractive index is 1.66 at a wavelength of 525nm.…”

Section: Fabrication and Experimental Resultsmentioning

confidence: 99%

“…A two-step iterative optimization algorithm is proposed to optimize each grating cell's parameters and improve the fabrication performance. Then, a DBA sample is fabricated by using our home-built parallel gray scale direct-write photo-lithography machine [21][22]. To verify the proposed design algorithm, both simulations and optical experiments are performed.…”

Section: Introductionmentioning

confidence: 99%

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Faceted gratings for an optical security feature

2020

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A method of optimizing and manufacturing a diffractive blazed grating array (DBA) is proposed to create a visual security feature when illuminated by a divergent Light emitting diode (LED) source. A pure phase grating array serving as the optical security component consists of blazed grating cells with the same size of 75μm. After a divergent spherical wave is decomposed into harmonic-waves, each grating cell of the DBA deflects locally the harmonic-waves into predefined directions and forms a feature pattern on the target plane. Particularly, a two-step optimization method is further developed for optimizing the period and orientation of each grating cell. The DBA sample is fabricated by using our home-built parallel direct-write photo-plotter with a resolution of 0.75 μm . Both numerical simulations and optical experiments are demonstrated to validate the proposed model. Since the optical security component developed is a surface relief structure of a single polymer material, it can be replicated for mass production by using standard roll to roll nano-imprint technology. This design algorithm proposed in this work will enable the extension of the optical security elements to a broader realm and facilitate extensive developments in other research fields of the optics community, such as light shaping, specific illumination for lithography and microscope systems.

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Section: Fabrication and Experimental Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Faceted gratings for an optical security feature

2020

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“…Empirically, eight levels is a good practical compromise. The optimized CGH was fabricated with our home-built photo-plotter [5], which has 16000×16000 pixels . When the fabricated CGH is illuminated by using a divergent LED (wavelength 525nm), see Fig.2 (b).…”

Section: Methodology and Resultsmentioning

confidence: 99%

An optimization approach of computer generated hologram (CGH) for divergent light shaping

Song

Pigeon

Theillier

et al. 2019

Digital Holography and Three-Dimensional Imaging 2019

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HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

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“…The mirror can be switched between stable positions with the light reflecting "on" and "off" directions by toggling the voltage applied to the individual micromirror. 26,27 The target sample is positioned on an automatic xy and z -axis motorized translation stage (XMS160, GTS30V, Newport) that can be moved axially in minimum step of 1 nm in xy direction and 1 µm in z direction. DMD pattern generation, and motorized stage movement are implemented by custom software programmed in Visual Basic.…”

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confidence: 99%

Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system

et al. 2018

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We report a flexible and efficient method to pattern two-dimensional (2D) multi-scale structures by digital-mask projective lithography (DMPL) with an alterable projective scaling system. In the developed DMPL system, femtosecond laser was modulated by digital micromirror device (DMD) to generate a designable intensity distribution with digital image information. The projective law of this DMPL system based on the geometric optics theory verified for different projective scaling lens systematically has been studied. With the combination of the customizable DMD elements and alterable projective scaling system, 2D designable patterned microstructures with multi-scale size range from millimeter to hundred nanometer have been achieved by a single exposure. In addition, an engineered Fresnel zone plate (FZP) with numerical aperture (NA) of 0.36 and focal length of 114 μm has been achieved by a single exposure of 1.2 s. The acquisition of the array of FZP lens shows the stability and efficiency of the pattern process. The proposed method could be expected to play an important role in the flexible and efficient fabrication of engineered 2D multi-scale structures.

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Direct write of optical diffractive elements and planar waveguides with a digital micromirror device based UV photoplotter

Cited by 22 publications

References 30 publications

Faceted gratings for an optical security feature

Faceted gratings for an optical security feature

An optimization approach of computer generated hologram (CGH) for divergent light shaping

Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system

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