2006
DOI: 10.1002/polb.20976
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Direct spincasting of polystyrene thin films onto poly(methyl methacrylate)

Abstract: The low vapor pressure solvent 1-chloropentane was used to directly spincast polystyrene (PS) films onto poly(methyl methacrylate) (PMMA) with smooth surfaces and sharp interfaces. Interface roughness after removal of the PS layer with cyclohexane was determined with scanning force microscopy to be <1 nm. Dynamic secondary mass spectroscopy revealed an interfacial width below the resolution limit of $10 nm. Large area bilayers with smooth surfaces could be created. In addition, direct spincasting with 1-chloro… Show more

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Cited by 31 publications
(31 citation statements)
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“…These multilayer films consist of a few to thousands of layers and each layer thickness can go down to the nanometer scale. Other methods to produce multilayer nanostructures at much smaller scale are: layering spin-coated films on top of each other [5,6] or layer-by-layer assembly [7].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…These multilayer films consist of a few to thousands of layers and each layer thickness can go down to the nanometer scale. Other methods to produce multilayer nanostructures at much smaller scale are: layering spin-coated films on top of each other [5,6] or layer-by-layer assembly [7].…”
Section: Introductionmentioning
confidence: 99%
“…The PMMA/PS bilayer system of spun cast thin films on a Si substrate has received considerable attention due to the fact that most of the properties of both polymers are well characterized [26e29]. PMMA/PS systems have been also widely used as model system for the investigations, among others, of interfacial width measurements, block copolymer morphology, antireflection coatings, physical blendings, and reactive compatibilization [6]. The physics related to the dewetting of bilayered or multilayered systems is far more complicated than the one applying to the above mentioned liquid-solid case.…”
Section: Introductionmentioning
confidence: 99%
“…In the SC method, a PS film was spin-coated on the PMMA bottom layer from 2 wt% solution of a selective solvent for PS. We employed 1-chloropentane as a selective solvent, which is reported to dissolve PS but not to dissolve PMMA [5] . PS/PMMA bilayers with a clear interference color were obtained and dried under vacuum at room temperature for 24 hours.…”
Section: Methodsmentioning
confidence: 99%
“…We selected cyclohexane, a perfect orthogonal solvent of PMMA, 26,27 and chloroform, a common solvent for P3HT, to prepare a mixed solvent for P3HT. Cyclohexane is also a bad solvent for P3HT, while chloroform is a good solvent for PMMA.…”
Section: Methodsmentioning
confidence: 99%