Abstract:Doping in Si nanocrystals is an interesting topic and to directly study the dopants distribution in phosphorous/boron co-doping circumstance is one of the important issue nowadays. In this study, atom probe tomography is performed to study the structures and impurity distribution in phosphorous/boron co-doped Si nanocrystals/SiO2 multilayers. Comparing with phosphorous singly-doped Si nanocrystals, it is interesting to find the phosphorous concentration in co-doped samples can be significantly improved. Theore… Show more
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